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Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering Electron-beam, X-ray, and ion-beam technology
- Language:
- English
- Subjects (All):
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- X-ray lithography--Congresses.
- X-ray lithography.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Other Title:
- Electron-Beam, X-Ray, and Ion Beam Technology
- Electron-beam, X-ray, and ion-beam technology
- Place of Publication:
- [Place of publication not identified] The Society 1988
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
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