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Photomask Japan 2017 : XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology / edited by Kiwamu Takehisa.
- Format:
- Book
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Masks (Electronics)--Congresses.
- Masks (Electronics).
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 1 online resource (264 pages)
- Other Title:
- Photomask Japan 2017
- Place of Publication:
- Bellingham, Washington : SPIE, 2017.
- Summary:
- Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
- Notes:
- Description based on publisher supplied metadata and other sources.
- ISBN:
- 1-5106-1390-0
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