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Advances in resist technology and processing XVII : microlithography 2000 : 27 February-3 March 2000, Santa Clara, CA, United States / editor, Francis M. Houlihan ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 3999.
- Proceedings of SPIE ; Volume 3999
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Photolithography--Congresses.
- Photolithography.
- Physical Description:
- 1 online resource (618 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2000.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
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