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Advances in resist technology and processing XXII : microlithography 2005 : 27 February-4 March 2005, San Jose, California, United States / editor, John L. Sturtevant ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 5753.
- Proceedings of SPIE ; Volume 5753
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (xliii, 1216 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2005.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
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