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Advances in resist technology and processing X : SPIE's 1993 Symposium on Microlithography : 28-5 February 1993, San Jose, CA, USA / editor, William D. Hinsberg ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Symposium on Microlithography (1993 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 1925.
- Proceedings of SPIE ; Volume 1925
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Photolithography--Congresses.
- Photolithography.
- Physical Description:
- 1 online resource (v, 192 pages).
- Place of Publication:
- Bellingham, Wash. : SPIE, 1993.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
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