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Advances in resist technology and processing XIII : SPIE's 1996 International Symposium on Microlithography : 10-15 March 1996, Santa Clara, CA, United States / editor, Roderick R. Kunz ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Microlithography (1996 : Santa Clara, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 2724.
- Proceedings of SPIE ; Volume 2724
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Photolithography--Congresses.
- Photolithography.
- Physical Description:
- 1 online resource (xi, 774 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 1996.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
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