1 option
Advances in resist technology and processing VIII : microlithography : 1-31 March 1991, San Jose, CA, United States / editor, Hiroshi Ito ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 1466.
- Proceedings of SPIE ; Volume 1466
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Photolithography--Congresses.
- Photolithography.
- Physical Description:
- 1 online resource (xii, 679 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 1991.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
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