1 option
Photomask technology 2016 : 12-14 September 2016, San Jose, California, United States / Bryan S. Kasprowicz, Peter D. Buck, editors ; sponsored by BACUS, SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 1996-756X. Volume 9985.
- Proceedings of SPIE ; Volume 9985
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (295 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2016.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed December 4, 2018).
- ISBN:
- 1-5106-0375-1
The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.