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Photomask Japan 2016 : XXIII Symposium on Photomask and Next-generation Lithography Mask Technology : 6-8 April 2016, Yokohama, Japan / Nobuyuki Yoshioka, editor ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 1996-756X. Volume 9984.
- Proceedings of SPIE ; Volume 9984
- Language:
- English
- Subjects (All):
- Masks (Electronics)--Congresses.
- Masks (Electronics).
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- X-ray lithography--Congresses.
- X-ray lithography.
- Physical Description:
- 1 online resource (250 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2016.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed December 4, 2018).
- ISBN:
- 1-5106-0373-5
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