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Optical microlithography XXIX : 23-25 February 2016, San Jose, California, United States / Andreas Erdmann, Jongwook Kye, editors ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Optical Microlithography (Conference) (29th : 2016 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 1996-756X. Volume 9780.
- Proceedings of SPIE ; Volume 9780
- Language:
- English
- Subjects (All):
- Microlithography--Congresses.
- Microlithography.
- Integrated circuits--Very large scale integration--Congresses.
- Integrated circuits.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 1 online resource (780 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2016.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed November 26, 2018).
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