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Advances in resist technology and processing XXIII : SPIE 31st International Symposium on Advanced Lithography : 19-24 February 2006, San Jose, California, United States / editor, Qinghuang Lin ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 6153.
- Proceedings of SPIE ; Volume 6153
- Language:
- English
- Subjects (All):
- Electric resistors--Congresses.
- Electric resistors.
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- Physical Description:
- 1 online resource (615 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2006.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
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