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Photomask technology 2017 : 11-14 September 2017, Monterey, California, United States / Peter D. Buck, Emily E. Gallagher, editors ; sponsored by BACUS, SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Symposium on Photomask Technology (2017 : Monterey, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 1996-756X. Volume 10451.
- Proceedings of SPIE ; Volume 10451
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Microlithography--Congresses.
- Microlithography.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 1 online resource (446 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2017.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed December 4, 2018).
- ISBN:
- 1-5106-1377-3
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