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EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

SPIE Digital Library Proceedings Available online

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Format:
Book
Conference/Event
Author/Creator:
European Mask and Lithography Conference, Corporate Author.
Contributor:
Maurer, Wilhelm, Contributor.
Behringer, Uwe F. W., Contributor.
Waelpoel, Jacques, Contributor.
BACUS (Technical group), Content Provider.
Society of Photo-Optical Instrumentation Engineers, Content Provider.
Conference Name:
European Mask and Lithography Conference (24th : 2008 : Dresden, Germany)
European Mask and Lithography Conference
Series:
Proceedings of SPIE EMLC 2008
Language:
English
Subjects (All):
Integrated circuits--Masks--Congresses.
Integrated circuits.
Microlithography--Congresses.
Microlithography.
Place of Publication:
[Place of publication not identified] SPIE 2008
Language Note:
English
Notes:
Bibliographic Level Mode of Issuance: Monograph

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