Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK

Format:

Book

Contributor:

Mack, Chris A., Contributor.

Stevenson, Tom, Contributor.

Scottish Enterprise, Content Provider.

Society of Photo-Optical Instrumentation Engineers, Content Provider.

Institution of Electrical Engineers, Content Provider.

European Optical Society, Content Provider.

Series:

Proceedings / SPIE--the International Society for Optical Engineering Lithography for semiconductor manufacturing II

Language:

English

Subjects (All):

Integrated circuits--Design and construction--Congresses.

Integrated circuits.

Semiconductors--Etching--Congresses.

Semiconductors.

Microlithography--Very large scale integration--Congresses.

Microlithography.

Integrated circuits--Congresses.

Place of Publication:

[Place of publication not identified] SPIE 2001

Language Note:

English

Notes:

Bibliographic Level Mode of Issuance: Monograph