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Photomask technology 2009 : 14-17 September 2009, Monterey, California, United States / Larry S. Zurbrick, M. Warren Montgomery, editors ; sponsored by BACUS, SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Symposium on Photomask Technology (29th : 2009 : Monterey, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 7488.
- Proceedings of SPIE ; Volume 7488
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (250 pages).
- Other Title:
- Symposium on Photomask Technology.
- Annual BACUS Symposium on Photomask Technology.
- BACUS Symposium on Photomask Technology.
- Place of Publication:
- Bellingham, Washington : SPIE, 2009.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed December 4, 2018).
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