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23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA

SPIE Digital Library Proceedings Available online

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Format:
Book
Conference/Event
Author/Creator:
Symposium on Photomask Technology, Corporate Author.
Contributor:
Staud, Wolfgang, Contributor.
Kimmel, Kurt Rudolf, Contributor.
BACUS (Technical group), Content Provider.
Society of Photo-Optical Instrumentation Engineers, Content Provider.
Conference Name:
Symposium on Photomask Technology (23rd : 2003 : Monterey, Calif.)
Series:
SPIE proceedings series 23rd Annual BACUS Symposium on Photomask Technology
Language:
English
Subjects (All):
Integrated circuits--Masks--Congresses.
Integrated circuits.
Microlithography--Congresses.
Microlithography.
Other Title:
Symposium on Photomask Technology and Management.
Place of Publication:
[Place of publication not identified] SPIE 2003
Language Note:
English
Notes:
Bibliographic Level Mode of Issuance: Monograph

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