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Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA

SPIE Digital Library Proceedings Available online

SPIE Digital Library Proceedings
Format:
Book
Contributor:
Tobin, Kenneth W, Contributor.
Ausschnitt, Christopher P, Contributor.
Emami, Iraj, Contributor.
Society of Photo Optical Instrumentation Engineers, Content Provider.
International SEMATECH, Content Provider.
Series:
Proceedings of SPIE Data analysis and modeling for process control II
Language:
English
Subjects (All):
Manufacturing processes--Mathematical models--Congresses.
Manufacturing processes--Automatic control--Congresses.
Intelligent control systems--Mathematical models--Congresses.
Process control--Mathematical models--Congresses.
Place of Publication:
[Place of publication not identified] SPIE 2005
Language Note:
English
Notes:
Bibliographic Level Mode of Issuance: Monograph

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