Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Format:

Book

Contributor:

Tobin, Kenneth W, Contributor.

Society of Photo Optical Instrumentation Engineers, Content Provider.

Society of Photo-optical Instrumentation Engineers, Content Provider.

International SEMATECH, Content Provider.

Semiconductor Equipment and Materials International, Content Provider.

Series:

SPIE proceedings series Data analysis and modeling for process control

Language:

English

Subjects (All):

Manufacturing processes--Mathematical models--Congresses.

Manufacturing processes.

Manufacturing processes--Automatic control--Congresses.

Intelligent control systems--Mathematical models--Congresses.

Intelligent control systems.

Process control--Mathematical models--Congresses.

Process control.

Place of Publication:

[Place of publication not identified] SPIE 2004

Language Note:

English

Notes:

Bibliographic Level Mode of Issuance: Monograph