Statistical case studies for industrial process improvement / Veronica Czitrom, Patrick D. Spagon.

Format:

Book

Author/Creator:

Czitrom, Veronica.

Contributor:

Spagon, Patrick D.

American Statistical Association.

Society for Industrial and Applied Mathematics.

Series:

ASA-SIAM series on statistics and applied probability.

ASA-SIAM series on statistics and applied probability

Language:

English

Subjects (All):

Process control--Statistical methods--Case studies.

Process control.

Semiconductor industry--Statistical methods--Case studies.

Semiconductor industry.

Physical Description:

1 electronic text (xxvii, 514 p.) : ill., digital file.

Place of Publication:

Philadelphia, Pa. : Society for Industrial and Applied Mathematics (SIAM, 3600 Market Street, Floor 6, Philadelphia, PA 19104), 1997.

Language Note:

English

System Details:

Mode of access: World Wide Web.

System requirements: Adobe Acrobat Reader.

Summary:

This book contains a broad selection of case studies written by professionals in the semiconductor industry that illustrate the use of statistical methods to improve manufacturing processes. These case studies offer engineers, scientists, technicians, and managers numerous examples of best-in-class practices by their peers. Because of the universal nature of statistical applications, the methods described here can be applied to a wide range of industries, including the chemical, biotechnology, automotive, steel, plastics, textile, and food industries. Many industries already benefit from the use of statistical methods, although the semiconductor industry is considered both a leader in and a model for the wide application and effective use of statistics.

Contents:

Table of contents

Foreword

Preface

Acknowledgments

Introduction

Facts about SEMATECH

SEMATECH qualification plan

Part One. Gauge studies

1. Introduction to gauge studies

2. Prometrix RS35e gauge study in five two-level factors and one three-level factor

3. Calibration of an FTIR spectrometer for measuring carbon

4. Revelation of a microbalance warm-up effect

5. GRR methodology for destructive testing and quantitative assessment of gauge capability for one-side specifications

Part Two. Passive data collection

6. Introduction to passive data collection

7. Understanding the nature of variability in a dry etch process

8. Virgin versus recycled wafers for furnace qualification, is the expense justified?

9. Identifying sources of variation in a wafer planarization process

10. Factors which affect the number of aerosol particles released by clean room operators

11. A skip-lot sampling plan based on variance components for photolithographic registration measurements

12. Sampling to meet a variance specification, clean room qualification

13. Snapshot, a plot showing progress through a device development laboratory

Part Three. Design of experiments

14. Introduction to design of experiments

15. Elimination of TiN peeling during exposure to CVD tungsten deposition process using designed experiments

16. Modeling a uniformity bulls-eye inversion

17. Using fewer wafers to resolve confounding in screening experiments

18. Planarization by chemical mechanical polishing, a rate and uniformity study

19. Use of experimental design to optimize a process for etching polycrystalline silicon gates

20. Optimization of a wafer stepper alignment system using robust design

21. Application of semi-empirical model building to the RTCVD of polysilicon

Part Four. Statistical process control

22. Introduction to statistical process control

23. Removing drift effects when calculating control limits

24. Implementation of a statistical process control capability strategy in the manufacture of raw printed circuit boards for surface mount technology

25. Obtaining and using statistical process control limits in the semiconductor industry

Part Five. Equipment reliability

26. Introduction to equipment reliability

27. Marathon report for a photolithography exposure tool

28. Experimentation for equipment reliability improvement

29. How to determine component-based preventive maintenance plans

Part Six. Comprehensive case study

30. Introduction to comprehensive case study

31. Characterization of a vertical furnace chemical vapor deposition (CVD) silicon nitride process

Appendix. Introduction to integrated circuit manufacturing

Glossary of selected statistical terms

Index of selected statistical terms.

Notes:

Bibliographic Level Mode of Issuance: Monograph

Includes bibliographical references and index.

Title from title screen, viewed 12/30/2010.

ISBN:

0-89871-976-3

Publisher Number:

SA01 SIAM