EUV lithography [electronic resource] / Vivek Bakshi, editor.

Format:

Book

Contributor:

Bakshi, Vivek.

Society of Photo-Optical Instrumentation Engineers.

Series:

SPIE Press monograph ; PM178.

SPIE Press monograph ; PM178

Language:

English

Subjects (All):

Ultraviolet radiation--Industrial applications.

Ultraviolet radiation.

Photolithography.

Optical coatings.

Physical Description:

1 online resource (702 p.)

Other Title:

Extreme ultraviolet lithography.

Place of Publication:

Bellingham, Wash. : SPIE Press : John Wiley & Sons, c2009.

Language Note:

English

Summary:

Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field.

Contents:

1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood

Introduction

The Early Stage of Development: 1981 to 1992

The Second Stage of Development: 1993 to 1996

Other Developments in Japan and Europe

The Development of Individual Technologies

EUVL Conferences

Summary.

2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm

Formation of the LLC

Program Structure

Program Results

Retrospective Observations

Status of EUV Development at the End of LLC

3. EUV Source Technology / Vivek Bakshi

EUV Source Requirements

DPP and LPP Source Technologies

EUV Source Performance

Summary and Future Outlook.

4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor

Properties of EUVL Systems.

4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli

General EUVL Optical Design Considerations

EUV Microsteppers

Engineering Test Stand (ETS)

Six-Mirror EUVL Projection Systems.

4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli

Specification

Projection Optics

Effect of Substrate Errors on Imaging Performance

Low-Frequency (Figure) Errors

Mid-Spatial-Frequency Errors

High-Spatial-Frequency Errors

Influence of Coatings on Roughness Specification

Calculation of Surface Errors

Uniformity

Substrate Materials

Fabrication

Metrology

Mounting and Assembly

Alignment

Condenser Optics.

4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt

Overview and History of EUV Multilayer Coatings

Choice of ML Materials and Wavelength Considerations

Multilayer Deposition Technologies

Theoretical design

High Reflectivity, Low Stress, and Thermal Stability Considerations

Optical Constants

Multilayer Thickness Specifications for Imaging and Condenser EUVL Mirrors.

5. EUV Optical Testing / Kenneth A. Goldberg

Target Accuracy

Techniques for Angstrom-scale EUV Wavefront Measurement Accuracy

Intercomparison

Future Directions.

6A. Optics Contamination / Saša Bajt

Fundamentals of Optics Contamination

Optics Contamination Control

6B. Grazing Angle Collector Contamination / Valentino Rigato

Collector Lifetime Status and Challenges

6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava

Overview of Normal-Incidence Collector Mirrors

Collector Performance

7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn

EUV Mask Structure and Process Flow

Mask Substrate

Mask Blank Fabrication

Absorber Stack and Backside Conductive Coating

Mask Patterning

Mask Cleaning

Advanced Mask Structure

8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard

Earliest EUV Resist Imaging

Absorption Coefficients of EUV Photoresists

Multilayer Resists and Pattern Transfer

Resist Types

PAGs and Acids

Line Edge Roughness

9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower

EUV Tool Design Considerations

EUV Microstepper

Reticle Imaging Microscope

10. Fundamentals of the EUVL Scanner / Kazuya Ota

Illumination Optics

Stages

Sensors

Handling Systems

Vacuum and Environment System

Budgets

11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok

Introduction: The Benefits of EUV Imaging

Imaging with the 0.1-NA ETS Optic

Imaging with the 0.3-NA MET Optic

System Contributors to Line Edge Roughness

Flare in EUVL Systems

12. Lithography Cost of Ownership / Phil Seidel

Cost of Ownership Overview

Lithography: Historical Cost and Price Trends

Major Lithography CoO Parameter and Productivity Drivers

General Observations on Lithography Cell and CoO Improvements (Past Decade)

CoO Considerations for Future Lithography Technologies

Summary

Appendix: Example Case Studies of Lithography CoO Calculations.

Notes:

Description based upon print version of record.

Includes bibliographical references and index.

Title from PDF t.p. (viewed on Feb. 25, 2010).

ISBN:

1-61583-717-5

0-8194-8070-3

OCLC:

606632694