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Principles of lithography / Harry J. Levinson.

Knovel Optics and Photonics Academic Available online

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Format:
Book
Author/Creator:
Levinson, Harry J.
Contributor:
Society of Photo-Optical Instrumentation Engineers.
Series:
SPIE Press monograph ; PM198.
Press monograph ; 198
Language:
English
Subjects (All):
Integrated circuits--Design and construction.
Integrated circuits.
Microlithography.
Physical Description:
1 online resource (525 p.)
Edition:
3rd ed.
Place of Publication:
Bellingham, Wash. : SPIE Press, c2010.
Language Note:
English
Summary:
The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Contents:
Preface to the third edition
Preface to the second edition
Preface
Chapter 1. Overview of lithography
Chapter 2. Optical pattern formation
Chapter 3. Photoresists
Chapter 4. Modeling and thin-film effects
Chapter 5. Wafer steppers
Chapter 6. Overlay
Chapter 7. Masks and reticles
Chapter 8. Confronting the diffraction limit
Chapter 9. Metrology
Chapter 10. Immersion lithography and the limits of optical lithography
Chapter 11. Lithography costs
Chapter 12. Extreme ultraviolet lithography
Chapter 13. Alternative lithography techniques
Appendix A: Coherence.
Notes:
Description based upon print version of record.
Title from PDF title page (SPIE eBooks Web site, viewed Oct. 22, 2010).
Includes bibliographical references and index.
ISBN:
1-5231-3206-X
1-68015-099-5
0-8194-8325-7
OCLC:
746472242

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