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Molecular beam epitaxy : a short history / John Orton and Tom Foxon.
- Format:
- Book
- Author/Creator:
- Orton, John, author.
- Foxon, Tom, author.
- Language:
- English
- Subjects (All):
- Molecular beam epitaxy.
- Physical Description:
- 1 online resource (529 p.)
- Edition:
- First edition.
- Place of Publication:
- Oxford : Oxford University Press, 2015.
- Language Note:
- English
- Summary:
- This volume describes the development of molecular beam epitaxy from its origins in the 1960s through to the present day. It begins with a short historical account of other methods of crystal growth, both bulk and epitaxial, to set the subject in context, emphasising the wide range of semiconductor materials employed. This is followed by an introduction to molecular beams and their use in the Stern-Gerlach experiment and the development of the microwave MASER.
- Contents:
- ""Cover""; ""Preface""; ""Contents""; ""1 Setting the Scene""; ""1.1 Importance of Single Crystal Growth""; ""1.2 VPE (Vapour Phase Epitaxy)""; ""1.3 LPE (Liquid Phase Epitaxy)""; ""1.4 A Wide Range of Materials""; ""2 MBE-The Early History""; ""2.1 Origins""; ""2.2 A History of Molecular Beams""; ""2.3 Molecular Beams Applied to Nucleation Studies""; ""2.4 Early Evaporation Methods""; ""2.5 The Bell Labs Involvement""; ""2.6 Superlattices and Low-Dimensional Structures""; ""2.7 1975: Current Status""; ""3 Machine Technology""; ""3.1 Overview""; ""3.2 Cell Design""; ""3.3 Beam Calibration""
- ""3.4 The Substrate Holder""""3.5 Load Locks""; ""3.6 In Situ Characterisation""; ""3.7 Commercial Machines""; ""4 Fundamentals""; ""4.1 Introduction""; ""4.2 Mass Spectrometer Studies""; ""4.3 RHEED (Reflection High Energy Electron Diffraction) Studies""; ""4.4 Scanning Tunnelling Microscopy""; ""4.5 Doping""; ""4.6 Theoretical Aspects""; ""4.7 MBE Operating Procedures""; ""5 Modified Growth Techniques""; ""5.1 Introduction""; ""5.2 Modulated Beam Techniques""; ""5.3 Use of Surfactants""; ""5.4 Gas Source MBE""; ""6 Low-Dimensional Structures""; ""6.1 MBE Grows Up""
- ""6.2 Structural Superlattices""""6.3 Doping Superlattices""; ""6.4 Quantum Wells""; ""6.5 Quantum Wires and Quantum Dots""; ""6.6 The Two-Dimensional Electron Gas (2DEG)""; ""7 Nitrides, Phosphides, Antimonides and Bismides""; ""7.1 Introduction""; ""7.2 Nitrides""; ""7.3 Phosphides""; ""7.4 Antimonides""; ""7.5 Highly Mismatched Alloys""; ""8 II-VI and IV-VI Compounds and Si/Ge""; ""8.1 II-VI Compounds""; ""8.2 IV-VI Compounds""; ""8.3 Silicon/Germanium""; ""9 Electronic Devices""; ""9.1 Introduction""; ""9.2 High Electron Mobility Transistors (HEMTs)""
- ""9.3 Heterojunction Bipolar Transistors (HBTs)""""9.4 Hall Effect Devices""; ""10 Optical Devices""; ""10.1 GaAs Lasers""; ""10.2 Quantum Well and Quantum Dot Lasers""; ""10.3 Alternative Materials""; ""10.4 Vertical Cavity and Quantum Cascade Lasers""; ""10.5 Photodetectors""; ""10.6 Solar Cells""; ""Companies and Institutions Index""; ""Materials Index""; ""Name Index""; ""General Index""
- Notes:
- Includes bibliographical references and index.
- Includes indexes.
- Description based on print version record.
- ISBN:
- 0-19-174884-6
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