Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond / by Guilei Wang.

Format:

Book

Author/Creator:

Wang, Guilei, author.

Contributor:

SpringerLink (Online service)

Series:

Physics and Astronomy (Springer-11651)

Springer Theses, Recognizing Outstanding Ph.D. Research,. 2190-5053

Springer Theses, Recognizing Outstanding Ph.D. Research, 2190-5053

Language:

English

Subjects (All):

Semiconductors.

Electronic circuits.

Nanotechnology.

Circuits and Systems.

Nanotechnology and Microengineering.

Local Subjects:

Semiconductors.

Circuits and Systems.

Nanotechnology and Microengineering.

Physical Description:

1 online resource (XVI, 115 pages).

Edition:

First edition 2019.

Contained In:

Springer eBooks

Place of Publication:

Singapore : Springer Singapore : Imprint: Springer, 2019.

System Details:

text file PDF

Summary:

This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling. As the CMOS technology roadmap calls for continuously downscaling traditional transistor structures, controlling the parasitic effects of transistors, e.g. short channel effect, parasitic resistances and capacitances is becoming increasingly difficult. The emergence of these problems sparked a technological revolution, where a transition from planar to three-dimensional (3D) transistor design occurred in the 22nm technology node. The selective epitaxial growth (SEG) method has been used to deposit SiGe as stressor material in S/D regions to induce uniaxial strain in the channel region. The thesis investigates issues of process integration in IC production and concentrates on the key parameters of high-quality SiGe selective epitaxial growth, with a special focus on its pattern dependency behavior and on key integration issues in both 2D and 3D transistor structures, the goal being to improve future applications of SiGe SEG in advanced CMOS.

Contents:

Introduction

Strain technology of Si-based materials

SiGe Epitaxial Growth and material characterization

SiGe Source and Drain Integration and transistor performance investigation

Pattern Dependency behavior of SiGe Selective Epitaxy

Summary and final words.

Other Format:

Printed edition:

ISBN:

978-981-15-0046-6

9789811500466

Access Restriction:

Restricted for use by site license.