Gas-phase synthesis of nanoparticles / edited by Yves Huttel.

Format:

Book

Contributor:

Huttel, Yves, editor.

Language:

English

Subjects (All):

Nanoparticles.

Physical Description:

1 online resource (419 pages) : illustrations

Edition:

1st ed.

Place of Publication:

Weinheim, Germany : Wiley-VCH, [2017]

Summary:

The first overview of this topic begins with some historical aspects and a survey of the principles of the gas aggregation method. The second part covers modifications of this method resulting in different specialized techniques, while the third discusses the post-growth treatment that can be applied to the nanoparticles. The whole is rounded off by a review of future perspectives and the challenges facing the scientific and industrial communities. An excellent resource for anyone working with the synthesis of nanoparticles, both in academia and industry.

Contents:

Cover

Title Page

Copyright

Contents

List of Contributors

Preface

Part I Introduction to Gas Phase Aggregation Sources

Chapter 1 History, Some Basics, and an Outlook

1.1 Introduction

1.2 Three Types of Gas Aggregation Sources

1.3 Development of the Magnetron Cluster Source

1.4 Deposition Machine and Mass Spectra

1.5 Some Experimental Questions

1.5.1 How Do the Clusters Start Growing?

1.5.2 The Role of Sputtered Dimers

1.5.3 Reduction of the Energy of the Impacting Ar+ Ions owing to Charge Exchange

1.5.4 Formation and Shape of the Racetrack

1.5.5 Loss of Intensity

1.6 Deposition of Clusters with Variable Kinetic Energy

1.7 Outlook and Future Development

Acknowledgments

References

Chapter 2 Principles of Gas Phase Aggregation

2.1 The Landscape

2.2 Step 2: Nucleation

2.2.1 First Phase Transition, Critical Temperature

2.2.2 Classical Nucleation Theory

2.2.3 CNT Failure for Metal-Like and Covalent-Like Bonding

2.3 Kinetic Nucleation Theory

2.3.1 Classical Approach: Bimolecular Reaction

2.3.2 RRKM Theory: Sticking Coefficient

2.3.3 Beyond

2.4 Clusters in Real Gases

2.4.1 Equilibrium State: Saturated Vapor

2.5 S &gt

1: Adiabatic Expansion

2.6 S ≫ 1: Supersonic Beam with Buffer Gas

2.7 Size Distribution

2.7.1 General Case

2.7.2 Von Smoluchowski

2.7.2.1 Step 3: Perfect Sticking

2.7.2.2 Step 4: Coagulation

2.8 Conclusion

Chapter 3 Types of Cluster Sources

3.1 High-Vacuum Free Beam Sources

3.2 Generic Aspects of Design

3.3 Seeded Supersonic Nozzle Source (SSNS)

3.4 Thermal Gas Aggregation Source (TGAS)

3.5 Sputter Gas Aggregation Source (SGAS)

3.6 Laser Ablation Source (LAS)

3.7 Pulsed-Arc Cluster Ion Source (PACIS)

3.8 Pulsed Microplasma Cluster Source (PMCS).

3.9 Comparison and Specialization of Sources

Part II Modifications of Gas Phase Aggregation Sources

Chapter 4 The Double-Laser Ablation Source Approach

4.1 Introduction

4.2 Source Description

4.2.1 Parameters Influencing Cluster Production

4.2.1.1 Laser Energy Density

4.2.1.2 Laser and Gas Pulse Timings

4.2.1.3 Carrier Gas Pressure

4.2.1.4 Target Position in the Source

4.3 Studies on Bimetallic Clusters

4.3.1 Size-Dependent Properties of Doped Au Clusters

4.3.2 Stability Patterns of AlPbN+ Clusters

4.3.3 Structure and Electronic Properties of Metal-Doped Si Clusters

4.3.4 The Production of Ag-Au Nanoalloy Clusters

4.4 Conclusions

Chapter 5 In-Plane Multimagnetron Approach

5.1 Introduction

5.2 The Multitarget Single-Magnetron Approach

5.3 The Multimagnetron Approach

5.4 Summary

Chapter 6 Adjustable Multimagnetron Approach

6.1 Introduction

6.2 Design and New Parameters of Multimagnetron Gas Aggregation Sources

6.3 Possibilities in the Fabrication of Nanoparticles with Multimagnetron Approach

6.3.1 Homogeneous Nanoparticles

6.3.2 Heterogeneous Nanoparticles

6.3.2.1 Alloyed Nanoparticles

6.3.2.2 Core-Shell Nanoparticles

6.4 Summary, Perspectives, and Applications

Chapter 7 Hollow Cylindrical Magnetron

7.1 Introduction

7.2 Project Design and Implementation

7.3 Characterization

7.4 Cluster Production

7.4.1 Cluster Source

7.4.2 Simple Metal Nanoclusters

7.4.3 Binary Nanoclusters

7.5 Alternative Cylindrical Geometries for Magnetron Sputtering

7.6 Concluding Remarks

Chapter 8 High-Flux DC Magnetron Sputtering

8.1 Introduction

8.2 Gas Flow

8.2.1 Beam Aperture

8.2.2 Aerodynamic Lenses

8.2.3 Gas Pulses.

8.3 Oxygen-Assisted Synthesis

8.3.1 Pulsed DC Magnetron Sources

8.4 Ion Beams

8.4.1 Ion Collection

8.4.2 Ion Beam Focusing

8.5 Conclusions

Chapter 9 High-Flux Metal Vapor Cell

9.1 Introduction

9.2 Vapor Cell Components

9.3 Vapor Pressure

9.4 Methods and Techniques

9.4.1 Molecular Beam Epitaxy

9.4.2 Electron Beam Epitaxy

9.5 Devices Using Metal Vapor Cells

9.5.1 Leicester University Mesoscopic Particle Source

9.5.2 Microgravity Devices

9.6 Summary

Chapter 10 Microwave Plasma Synthesis of Nanoparticles

10.1 Introduction

10.1.1 Basic Ideas

10.1.2 Energy Transfer in a Microwave Plasma

10.1.3 Formation of Nanoparticles in a Microwave Plasma

10.2 Basic Design of Microwave Plasma Systems and Resulting Products

10.3 Realization of Microwave Plasma Systems for Synthesis of Coated Nanoparticles

10.4 Conclusions

Chapter 11 Enhanced Synthesis of Aggregates by Reduced Temperature, Pulsed Magnetron Sputtering, and Pulsed Buffer Gas Delivery

11.1 Introduction to Nanoparticle Aggregation

11.2 Experiment

11.3 Kinetic Phenomena during Cluster Growth

11.3.1 Thermalization after Magnetron Sputtering

11.3.2 Drift of Clusters

11.3.3 Passage through an Orifice

11.3.4 Temperature Dependence of Cluster Growth

11.3.5 Cluster Velocity

11.3.6 Cluster Charge

11.4 Pulsed Sputtering of Metal Target

11.4.1 DC versus DC-Pulsed Magnetron Sputtering

11.4.2 Effect of Duty Cycle

11.5 Pulsed Delivery of Buffer Gas

11.5.1 Pulsed-Gas Delivery and Experiment

11.5.2 Cluster Growth during the Gas Pulse

11.6 Cluster Mass Flux in a Gas Dynamic System

11.7 Conclusions

Chapter 12 High-Power Pulsed Plasmas

12.1 Background: High-Power Impulse Magnetron Sputtering.

12.2 Synthesis of Nanoparticles Using High-Power Pulsed Plasmas

12.2.1 Charging of Nanoparticles in a Plasma

12.2.2 Nanoparticle Growth

12.2.3 Growth of Nanoparticles in a Pulsed Plasma

12.3 Summary and Outlook

Chapter 13 High-Pressure and Reactive Gas Magnetron Sputtering

13.1 Introduction

13.2 Types of Reactive Sputtering

13.3 Hysteresis Effect in DC Reactive Sputtering

13.4 Methods to Overcome Hysteresis

13.4.1 Increasing the Pumping Speed

13.4.2 Partial Pressure Control of Reactive Gas

13.4.3 Cathode Voltage Control

13.4.4 Increasing the Target-Substrate Distance

13.4.5 Using a Baffle System

13.4.6 Pulsed Reactive Gas Flow

13.5 Arcing in Reactive Sputter Deposition

13.6 Methods to Overcome Arcing Problem

13.6.1 Unipolar Pulsed Magnetron Sputtering

13.6.2 Bipolar Pulsed Magnetron Sputtering

13.6.2.1 Using a Single Magnetron Source

13.6.2.2 Using Two Magnetron Sources

13.6.3 Elimination of Arcing Using Substoichiometric Targets

13.7 Modeling of Reactive Sputtering

13.7.1 Steady-State Condition at the Target Surface

13.7.2 Steady-State Condition at the Collecting (Substrate) Surface

13.8 Implementation of High-Pressure and Reactive Gas Sputtering in Gas Aggregation Sources (GASs)

13.8.1 Properties of the Deposited Nanoparticles

13.8.2 Influence of Reactive Gas

13.8.3 Influence of Magnetron Power

13.8.4 Influence of Process Parameters

13.8.5 Continuous DC Supply versus Pulsed DC Power Supply

13.9 Conclusion

Acknowledgment

Part III In-Flight Post-Growth Manipulation of Nanoparticles

Chapter 14 Coating

14.1 Core/Shell Nanoparticles

14.2 Fabrication Methods

14.3 Structural Modification via In-flight Coating

14.4 Summary

Chapter 15 Nanostructuring, Orientation, and Annealing.

15.1 Introduction and Scope

15.2 Control of Crystal Structures

15.2.1 Plasma-Condensation-Type Cluster Deposition Method

15.2.2 Direct Formation of Magnetic Nanoparticles with High-Anisotropy Structures

15.2.3 Postgrowth Annealing

15.2.4 Growth of Dielectric Oxide Nanoparticles

15.2.5 Orientation/Alignment of Magnetic Nanoparticles

15.3 Nanostructuring

15.3.1 Dielectric Nanocomposites

15.3.2 Cluster-Assembled Exchange-Coupled Nanostructures

15.4 Conclusions

Chapter 16 Deflection and Mass Filtering

16.1 Introduction

16.2 Magnetic Deflection

16.3 The Time-of-Flight Mass Filter

16.4 The Reflectron TOF Mass Filter

16.5 The Quadrupole Mass Filter

16.6 Aerodynamic Lenses

16.7 The Wien Filter

16.8 Magnetic Sector

16.9 Cluster Ion Traps

16.10 Matter-Wave Interferometry

16.11 Comparison of Mass Filters

16.12 Mass Filtering Requirements for Applications

16.13 Conclusions

Chapter 17 In-Flight and Postdeposition Manipulation of Mass-Filtered Nanoparticles under Soft-Landing Conditions

17.1 Introduction

17.2 In-Flight Manipulation of Cluster Beams

17.2.1 Beam Shaping

17.2.2 Mass Filtering

17.2.3 In-Flight Processing

17.3 Soft Landing

17.3.1 Contact Formation and Related Phenomena

17.3.2 Variation of Kinetic Energies

17.3.3 Postdeposition Treatment

17.4 Summary

Chapter 18 In-Flight Analysis

18.1 Introduction

18.2 Electron Diffraction and X-ray Scattering Analysis of Clusters and Nanoparticles

18.3 Photoelectron and X-ray Absorption Spectroscopy

18.4 Magnetic Deflection Experiments

18.5 X-ray Magnetic Circular Dichroism Experiments

18.6 Conclusions

Part IV Perspectives.

Chapter 19 Nano- and Micromanufacturing with Nanoparticles Produced in the Gas Phase: An Emerging Tool for Functional and Length-Scale Integration.

Notes:

Includes bibliographical references and index.

Description based on online resource; title from PDF title page (ebrary, viewed March 10, 2017).

ISBN:

9783527698424

3527698426

9783527698417

3527698418

OCLC:

974040266