Introduction to focused ion beam nanometrology / David C. Cox.

Format:

Book

Author/Creator:

Cox, David C. (David Christopher), 1965- author.

Contributor:

Morgan & Claypool Publishers, publisher.

Institute of Physics (Great Britain), publisher.

Series:

IOP (Series). Release 2.

IOP concise physics

[IOP release 2]

IOP concise physics, 2053-2571

Language:

English

Subjects (All):

Nanostructured materials--Measurement.

Nanostructured materials.

Measurement.

Physical Description:

1 online resource (various pagings) : illustrations (some color).

Distribution:

Bristol [England] : IOP Publishing, [2015]

Place of Publication:

San Rafael [California] : Morgan & Claypool Publishers, [2015]

System Details:

Mode of access: World Wide Web.

System requirements: Adobe Acrobat Reader.

text file

Biography/History:

David C. Cox received his PhD from the Department of Metallurgy and Materials Science University of Cambridge, UK in 2001. He is currently a senior research fellow at the Advanced Technology Institute, University of Surrey, UK and has been seconded to the National Physical Laboratory, UK as a senior research scientist since 2005. Having a broad background in industry and academia covering many aspects of materials science, physics and electronic engineering, he has published close to 100 articles at the time of writing. Largely associated with both the Quantum Metrology and Materials groups at NPL, his most recent research work has concentrated on the area of using focused ion beam to fabricate devices for quantum metrology. Additionally, he has developed a strong interest in wider aspects of FIB fabrication and fundamental understanding of how focused ion beam can be used to study materials and the errors associated with aspects of the technique.

Summary:

This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

Contents:

Preface

Acknowledgements

Author biography

1. Metrology

1.1. What is metrology?

1.2. Metrology in the FIB

2. Focused ion beam

2.1. Introduction to the FIB instrument

2.2. Types of instrument

2.3. Gas injection systems

2.4. Patterning options

2.5. Other equipment and techniques found on FIB instruments

3. Ion-solid interactions

3.1. Overview

3.2. Imaging-secondary electrons and secondary ions

3.3. Ion milling-ion range, sputter yield and damage

3.4. Software to approximate ion range, damage and sputter yield

4. Focused ion beam-materials science applications

4.1. Overview

4.2. TEM foils and cross-sectioning

4.3. Three-dimensional reconstruction

4.4. Mechanical testing

4.5. Residual stress measurement and deformation

4.6. Secondary ion mass spectrometry and atom probe

5. Focused ion beam fabrication for metrology

5.1. Overview

5.2. Superconducting devices

5.3. Utilising manipulation systems

5.4. AFM cantilevers and dimensional artefacts for scanning probe techniques

5.5. Other devices

6. Future developments

6.1. Where we currently are

6.2. The end of the Ga ion source?

6.3. Final thoughts.

Notes:

"Version: 20151001"--Title page verso.

"A Morgan & Claypool publication as part of IOP Concise Physics"--Title page verso.

Includes bibliographical references.

Title from PDF title page (viewed on November 1, 2015).

Other Format:

Print version:

ISBN:

9781681740843

9781681742120

OCLC:

928530411

Access Restriction:

Restricted for use by site license.