Developments in surface contamination and cleaning [electronic resource] : fundamentals and applied aspects. Volume 2, Particle deposition, control and removal / edited by Rajiv Kohli and Kashmiri L. Mittal.

Format:

Book

Contributor:

Kohli, Rajiv, 1947-

Mittal, K. L., 1945-

Language:

English

Subjects (All):

Cleaning.

Coatings.

Dust control.

Particles--Measurement.

Particles.

Surface contamination--Prevention.

Surface contamination.

Surfaces (Technology).

Physical Description:

1 online resource (311 p.)

Other Title:

Particle deposition, control and removal

Place of Publication:

Amsterdam : Elsevier, c2010.

Summary:

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced modelsTypes of strippab

Contents:

Front Cover; Developments in Surface Contaminationand Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1Particle Deposition onto Enclosure Surfaces; 1. INTRODUCTION; 2. BACKGROUND; 3. MECHANISMS OF PARTICLE TRANSPORT; 4. PARAMETERS FOR PARTICLE DEPOSITIONCHARACTERIZATION; 5. METHODS FOR MEASUREMENT OF PARTICLE DEPOSITION; 6. REVIEW OF EXPERIMENTAL STUDIES; 7. MODELING PARTICLE DEPOSITION AND THEEXPERIMENTAL VALIDATIONS; 8. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; Chapter 2Contamination Control: A Systems Approach; 1. INTRODUCTION; 2. A SYSTEMS APPROACH

3. EFFECT OF CONTAMINATION CONTROL MEASURES ONRPN SCORES4. PITFALLS; 5. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 3Particles in Semiconductor Processing; 1. INTRODUCTION; 2. THEORY; 3. PARTICLE REMOVAL STUDY; 4. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 4Continuous Contamination Monitoring Systems; 1. INTRODUCTION; 2. CASE STUDIES OF TRADITIONAL VERSUS CRITICAL ANDBUSY SAMPLING FOR AIRBORNE PARTICLE COUNTS; 3. IN SITU PARTICLE MONITORING OF CLEANINGEQUIPMENT; 4. WHAT TO CONTINUOUSLY MONITOR IN HIGHTECHNOLOGYMANUFACTURING; REFERENCES

Chapter 5Strippable Coatings for Removal of Surface Contaminants1. INTRODUCTION; 2. COATING DESCRIPTION; 3. TYPES OF STRIPPABLE COATINGS; 4. ISSUES WITH STRIPPABLE COATINGS; 5. PRECISION CLEANING APPLICATIONS; 6. SUMMARY; ACKNOWLEDGEMENTS; DISCLAIMER; REFERENCES; Chapter 6Ultrasonic Cleaning; 1. INTRODUCTION; 2. ULTRASONIC CLEANING; 3. PRINCIPLES OF ULTRASONIC CLEANING; 4. SURFACE CLEANLINESS MEASUREMENT; 5. THEORY OF ULTRASONIC CLEANING; 6. EXPERIMENTS IN SONIC CLEANING; 7. CLEANING OPTIMIZATION; ACKNOWLEDGEMENTS; REFERENCES; Index; ColorPlates

Notes:

Description based upon print version of record.

Includes bibliographical references and index.

ISBN:

1-282-73820-8

9786612738203

1-4377-7831-3

OCLC:

700703767