Handbook of chemical vapor deposition / by Hugh O. Pierson.

Format:

Book

Author/Creator:

Pierson, Hugh O.

Contributor:

Pierson, Hugh O.

Language:

English

Subjects (All):

Chemical vapor deposition--Handbooks, manuals, etc.

Chemical vapor deposition.

Vapor-plating--Handbooks, manuals, etc.

Vapor-plating.

Physical Description:

1 online resource (507 p.)

Edition:

2nd ed.

Place of Publication:

Norwich, NY : Noyes Publications, 1999.

Language Note:

English

Summary:

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest

Contents:

Front Cover; Handbook of Chemical Vapor Depostion (CVD): Principles, Technology, and Applications; Copyright Page; Contents; Chapter 1. Introduction and General Considerations; 1.0 INTRODUCTION; 2.0 HISTORICAL PERSPECTIVE; 3.0 THE APPLICATIONS OF CVD; 4.0 PROFILE OF THE CVD BUSINESS; 5.0 BOOK OBJECTIVES; 6.0 BACK GROUND REFERENCES; REFERENCES; Chapter 2. Fundamentals of Chemical Vapor Deposition; 1.0 INTRODUCTION; 2.0 THERMO DYNAMICS OF CVD; 3.0 KINETICS AND MASS-TRANSPORT MECHANISMS; 4.0 GROWTH MECHANISM AND STRUCTURE OF DEPOSIT; RFERENCES; Chapter 3. The Chemistry of CVD

1.0 CATEGORIES OF CVD REACTIONS2.0 CVD PRECURSORS; 3.0 HALIDE PRECURSORS; 4.0 METAL-CARBONYL PRECURSORS; 5.0 HYDRIDE PRECURSORS; REFERENCES; Chapter 4. Metallo-Organic CVD (MOCVD); 1.0 INTRODUCTION; 2.0 MOCVD PROCESS AND EQUIPMENT; 3.0 MOCVD PRECURSORS: ALKYL,ALICYCLIC, AND ARYL COMPOUNDS; 4.0 ACETYLACETO NATE COM POUNDS; 5.0 MOCVD REACTIONS FOR THE DEPOSITION OF METALS; 6.0 MOCVD REACTIONS FOR THE DEPOSITION OF CARBIDES AND NITRIDES; 7.0 MOCVD REACTIONS FOR THE DEPOSITION OF OXIDES; 8.0 MOCVD REACTIONS FOR THE DEPOSITION OFIII...V AND II...-VI COMPOUNDS; 9.0 GENERAL APPLICATIONS OF MOCVD

REFERENCESChapter 5. CVD Processes and Equipment; 1.0 INTRODUCTION; 2.0 CLOSED AND OPEN REACTOR; 3.0 REACTANT SUPPLY; 4.0 THERMAL CVD: DEPOSITION SYSTEM AND REACTOR DESIGN; 5.0 EXHAUST AND BY-PRODUCT DISPOSAL; 6.0 LASER AND PHOTO CVD; 7.0 CHEMICAL VAPOR INFILTRATION (CVI); 8.0 FLUIDIZED-BED CVD; 9.0 PLASMA CVD; REFERENCES; Chapter 6. The CVD of Metals; 1.0 INTRODUCTION; 2.0 ALUM INUM; 3.0 BERYLLIUM; 4.0 CHROMIUM; 5.0 COPPER; 6.0 GOLD; 7.0 MOLYBDENUM; 8.0 NICKEL; 9.0 NIOBIUM (COLUMBIUM); 10.0 PLATINUM AND PLATINUM GROUP METALS; 11.0 RHENIUM; 12.0 TANTALUM; 13.0 TITANIUM; 14.0 TUNGSTEN

15.0 OTHER METALS16.0 INTERM ETALLICS; REFERENCES; Chapter 7. The CVD of the Allotropes of Carbon; 1.0 THE ALL OTROPES OF CARBON; 2.0 THE CVD OF GRAPHITE; 3.0 THE CVD OF DIAMOND; 4.0 THE CVD OF DIAMOND-LIKE-CARBON (DLC); REFERENCES; Chapter 8. The CVD of Non-Metallic Elements; 1.0 INTRODUCTION; 2.0 THE CVD OF BORON; 3.0 THE CVD OF SILICON; 4.0 THE CVD OF GERMANIUM; REFERENCES; Chapter 9. The CVD of Ceramic Materials: Carbides; 1.0 INTRODUCTION; 2.0 THE CVD OF BORON CARBIDE; 3.0 THE CVD OF CHROMIUM CARBIDE; 4.0 THE CVD OF HAFNIUM CARBIDE; 5.0 THE CVD OF NIOBIUM CARBIDE

6.0 THE CVD OF SILICON CARBIDE7.0 THE CVD OF TANTALUM CARBIDE; 8.0 THE CVD OF TITANIUM CARBIDE; 9.0 THE CVD OF TUNGSTEN CARBIDE; 10.0 THE CVD OF ZIRCONIUM CARBIDE; 11.0 THE CVD OF MISCELLANEOUS CARBIDES; REFERENCES; Chapter 10. The CVD of Ceramic Materials: Nitrides; 1.0 GENERAL CHARACTERISTICS OF NITRIDES; 2.0 THE CVD OF ALUMINUM NITRIDE; 3.0 THE CVD OF HEXAGONAL BORON NITRIDE; 4.0 THE CVD OF CUBIC BORON NITRIDE; 5.0 THE CVD OF HAFNIUM NITRIDE; 6.0 THE CVD OF NIOBIUM NITRIDE; 7.0 THE CVD OF SILICON NITRIDE; 8.0 THE CVD OF TITANIUM NITRIDE; 9.0 THE CVD OF TITANIUM CARBONITRIDE

10.0 THE CVD OF OTHER NITRIDES

Notes:

Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992.

Includes bibliographical references and index.

Related Work:

Pierson, Hugh O. Handbook of chemical vapor deposition (CVD)

ISBN:

1-282-00259-7

9786612002595

0-8155-1743-2

OCLC:

437108180