My Account Log in

1 option

Handbook of vacuum arc science and technology : fundamentals and applications / edited by Raymond L. Boxman, David M. Sanders, Philip J. Martin ; foreword by James M. Lafferty.

Knovel Electronics & Semiconductors Academic Available online

View online
Format:
Book
Contributor:
Boxman, R. L.
Sanders, David M.
Martin, Philip J.
Series:
Materials science and process technology series.
Materials science and process technology series
Language:
English
Subjects (All):
Vacuum arcs.
Vacuum arcs--Industrial applications.
Plasma (Ionized gases).
Physical Description:
1 online resource (775 p.)
Place of Publication:
Park Ridge, N.J. : Noyes Publications, c1995.
Language Note:
English
Summary:
This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
Contents:
pt. 1. Fundamentals of vacuum arc science and technology
pt. 2. Applications of vacuum arc science and technology.
Notes:
Description based upon print version of record.
Includes bibliographical references and index.
ISBN:
9786612755071
1-282-75507-2
1-59124-098-0
OCLC:
437112374

The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.

Find

Home Release notes

My Account

Shelf Request an item Bookmarks Fines and fees Settings

Guides

Using the Find catalog Using Articles+ Using your account