Semiconductor industrial hygiene handbook : monitoring, ventilation, equipment, and ergonomics / by Michael E. Williams and David G. Baldwin ; contributing author, Paul C. Manz.

Format:

Book

Author/Creator:

Williams, Michael E.

Contributor:

Baldwin, David G.

Manz, Paul C.

Language:

English

Subjects (All):

Semiconductor industry--Safety measures.

Semiconductor industry.

Industrial hygiene.

Semiconductor industry--Employees--Health and hygiene.

Physical Description:

1 online resource (363 p.)

Place of Publication:

Park Ridge, N.J. : Noyes Publications, c1995.

Language Note:

English

Summary:

This book provides a comprehensive review of the primary industrial hygiene topics relevant to semiconductor processing: chemical and physical agents, and ventilation systems. The book also has excellent chapters on newer industrial hygiene concerns that are not specific to the semiconductor industry: ergonomics, indoor air quality, personal protective equipment, plan review, and records retention. While much of the information in these chapters can be applied to all industries, the focus and orientation is specific to issues in the semiconductor industry.

Contents:

Front Cover; Semiconductor Industrial Hygiene Handbook: Monitoring, Ventilation, Equipment and Ergonomics; Copyright Page; Contents; Chapter 1. Introduction; 1.0 FOREWORD; 2.0 OVERVIEW OF BOOK; 3.0 BACKGROUND; REFERENCES; Chapter 2. Industrial Hygiene Monitoring; 1.0 OVERVIEW OF IH MONITORING; 2.0 ASSESSMENT TOOLS; 3.0 BIOMONITORING: URINARY ARSENIC TESTING; 4.0 CHEMICAL AGENTS; REFERENCES; Chapter 3. Industrial Hygiene Monitoring: Physical Agents; 1.0 NOISE; 2.0 NON-IONIZING RADIATION; 3.0 IONIZING RADIATION; REFERENCES; Chapter 4. Ventilation; 1.0 Background; 2.0 TYPES; 3.0 MONITORING

4.0 GUIDELINES/STANDARDSREFERENCES; Chapter 5. Personal Protective Equipment (PPE); 1.0 BACKGROUND; 2.0 CHEMICAL PROTECTIVE GLOVES; 3.0 RESPIRATORY PROTECTION; REFERENCES; Chapter 6. Indoor Air Quality (IAQ); 1.0 RECOGNITION OF IAQ PROBLEMS; 2.0 ODOR IDENTIFICATION; 3.0 CAUSATIVE AGENTS; 4.0 EVALUATION OF IAQ PROBLEMS; 5.0 GENERALLY RECOGNIZED ACCEPTABLE LEVELS; 6.0 INDUSTRIAL HYGIENE IAQ MONITORING EQUIPMENT; 7.0 PREVENTION OF IAQ PROBLEMS; 8.0 RECORDS; REFERENCES; Chapter 7. Ergonomics; 1.0 BACKGROUND; 2.0 IDENTIFICATION AND EVALUATION OF PHYSICAL STRESSORS

3.0 STRESSFUL POSTURES ASSOCIATED WITH CTD'S4.0 SEMICONDUCTOR ERGONOMIC/MATERIAL HANDLING EXPOSURES; 5.0 ERGONOMIC DESIGN AND LAYOUT PRINCIPLES; 6.0 SEMICONDUCTOR EQUIPMENT; 7.0 SUMMARY; REFERENCES; Chapter 8. Industrial Hygiene Recordkeeping; 1.0 GENERAL; 2.0 CONTINUOUS MONITOR RECORDS; 3.0 VENTILATION RECORDS; 4.0 EMPLOYEE COMMUNICATION; 5.0 PERSONNEL RECORDS; REFERENCES; Chapter 9. Plan Review; 1.0 OVERVIEW; REFERENCES; Appendices; Appendix A: Silicon Ingot and Wafer Manufacturing*; POLYCRYSTALLINE ("POLY") SILICON PRODUCTION; SINGLE CRYSTAL INGOT GROWTH; INGOT EVALUATION; SLICING

POLISHINGFINAL PROCESSING; Appendix B: Silicon Device Manufacturing Introduction*; SILICON DEVICE MANUFACTURING (IC AND DISCRETE); Appendix C: III-V (GaAs)*; III-V INGOT AND WAFER: LIGHT-EMITTING DIODES (LED); Appendix D: III-V Device: Microwave IC*; GaAs TRANSISTOR FABRICATION; HYBRID CIRCUIT FABRICATION; MODULE ASSEMBLY; Appendix E: Ion Implanter Maintenance Safety Considerations; ION IMPLANTER SAFETY CONSIDERATIONS DURING MAINTENANCE FOLLOWING ARSENIC AND PHOSPHOROUS OPERATIONS; Appendix F: Bibliography; Glossary and Acronyms; Index

Notes:

Description based upon print version of record.

Includes bibliographical references and index.

ISBN:

9786612027437

0-8155-1897-8

1-59124-144-8

OCLC:

437112383