Handbook of deposition technologies for films and coatings : science, technology, and applications / edited by Rointan F. Bunshah.

Format:

Book

Contributor:

Bunshah, R. F. (Rointan Framroze)

Series:

Materials science and process technology seriess

Language:

English

Subjects (All):

Coating processes.

Surfaces (Technology).

Physical Description:

1 online resource (887 p.)

Edition:

2nd ed.

Place of Publication:

Park Ridge, N.J. : Noyes Publications, c1994.

Language Note:

English

Summary:

This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Contents:

Front Cover; Handbook of Ellipsometry; Copyright Page; Contents; Part 1: Theory of Ellipsometry; Chapter 1. Polarized Light and Ellipsometry; 1.1 A Quick Guide to Ellipsometry; 1.2 Maxwell and Wave Equations; 1.3 Representations of Polarization; 1.4 Propagation of Polarized Light; 1.5 Reflection and Transmission of Polarized Light at Planar Interfaces; 1.6 References; Chapter 2. Optical Physics of Materials; 2.1 Introduction; 2.2 Propagation of Light in Solids; 2.3 Classical Theories of the Optical Properties of Solids; 2.4 Quantum Mechanical Theories of the Optical Properties of Solids

2.5 Modeling the Optical Properties of Solids2.6 Overview and Concluding Remarks; 2.7 References and Bibliography; Chapter 3. Data Analysis for Spectroscopic Ellipsometry; 3.1 Introduction; 3.2 Ellipsometry Parameters; 3.3 Calculation of Complex Reflection Coefficients; 3.4 Models for Dielectric Functions; 3.5 Fitting Models to Data; 3.6 Determination of Optical Functions from Spectroscopic Ellipsometry Data; 3.7 Depolarization; 3.8 Further Reading and References; Part 2: Instrumentation; Chapter 4. Optical Components and the Simple PCSA (Polarizer, Compensator, Sample, Analyzer) Ellipsometer

4.1 General4.2 The Components; 4.3 Ellipsometer Component Configurations; 4.4 References; Chapter 5. Rotating Polarizer and Analyzer Ellipsometry; 5.1 Introduction; 5.2 Comparison of Ellipsometers; 5.3 Instrumentation Issues; 5.4 Data Reduction for the Rotating Polarizer and Analyzer Ellipsometers; 5.5 Precision Considerations; 5.6 Calibration Procedures; 5.7 Summary: Recent and Future Directions; 5.8 References; Chapter 6. Polarization Modulation Ellipsometry; 6.1 Introduction; 6.2 The Photoelastic Modulator (PEM); 6.3 Experimental Configurations of Polarization Modulation Ellipsometers

6.4 Light Intensity Through a Polarization Modulation Ellipsometer6.5 Waveform Analysis; 6.6 Calibration Procedures; 6.7 Errors; 6.8 Further Reading and References; Chapter 7. Multichannel Ellipsometry; 7.1 Introduction; 7.2 Overview of Instrumentation; 7.3 Rotating-Element Designs; 7.4 Concluding Remarks; 7.5 References; Part 3: Critical Reviews of Some Applications; Chapter 8. SiO2 Films; 8.1 Introduction; 8.2 Historical Perspective - Prior to 1970; 8.3 Modern Studies - Since 1970; 8.4 Conclusions; 8.5 References; Chapter 9. Theory and Application of Generalized Ellipsometry

9.1 Introduction9.2 The Generalized Ellipsometry Concept; 9.3 Theory of Generalized Ellipsometry; 9.4 Special Generalized Ellipsometry Solutions; 9.5 Strategies in Generalized Ellipsometry; 9.6 Generalized Ellipsometry Applications; 9.7 Conclusions; 9.8 Further Reading and References; Part 4: Emerging Areas in Ellipsometry; Chapter 10. VUV Ellipsometry; 10.1 Introduction; 10.2 Historical Review of Short Wavelength Ellipsometry; 10.3 VUV Ellipsometry Today; 10.4 Importance of VUV Ellipsometry; 10.5 Survey of Applications; 10.6 Future of VUV Ellipsometry; 10.7 Acknowledgments; 10.8 References

Chapter 11. Spectroscopic Infrared Ellipsometry

Notes:

Rev. ed. of: Deposition technologies for films and coatings. c1982.

Includes bibliographical references and index.

ISBN:

1-282-00262-7

0-08-094588-0

0-8155-1746-7

OCLC:

726734914