2 options
Chemical vapour deposition : precursors, processes and applications / edited by Anthony C. Jones, Michael L. Hitchman.
- Format:
- Book
- Language:
- English
- Subjects (All):
- Chemical vapor deposition.
- Vapor-plating.
- Physical Description:
- 1 online resource (599 p.)
- Edition:
- 1st ed.
- Other Title:
- Chemical vapor deposition
- Place of Publication:
- Cambridge, UK : Royal Society of Chemistry, c2009.
- Language Note:
- English
- Summary:
- Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes
- Contents:
- 9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582
- Notes:
- Description based upon print version of record.
- Includes bibliographical references and index.
- ISBN:
- 9781621987031
- 1621987035
- 9781847558794
- 1847558798
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