Lithography : principles, processes and materials / Theodore C. Hennessy, editor.

Format:

Book

Contributor:

Hennessy, Theodore C.

Series:

Engineering tools, techniques and tables.

Nanotechnology science and technology series.

Engineering tools, techniques and tables

Nanotechnology science and technology

Language:

English

Subjects (All):

Microlithography.

Microfabrication.

Physical Description:

1 online resource (299 p.)

Edition:

1st ed.

Place of Publication:

New York : Nova Science, c2011.

Language Note:

English

Summary:

Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nonfabrication technologies and manufacturing of integrated circuits (IC). This book presents topical research from across the globe in the study of lithography; its principles, processes and materials.

Contents:

""LITHOGRAPHY:PRINCIPLES, PROCESSES AND MATERIALS""; ""CONTENTS""; ""PREFACE""; ""PRINCIPLE, PROCESSES AND MATERIALS FOR NANO IMPRINT LITHOGRAPHY""; ""1. INTRODUCTION""; ""2. PRINCIPLE AND FUNDAMENTAL PROCESS FOR NIL""; ""2.1. Principle of NIL""; ""2.2. Theoretical Analysis for NIL""; ""2.3. Fundamental Process for NIL""; ""3. VARIATIONS OF NIL PROCESSES""; ""3.1. Combined Thermal and UV-NIL""; ""3.2. Reverse Imprint Process""; ""3.3. Laser-Assisted Direct Imprint""; ""3.4. Roll Imprint Process""; ""3.5. Substrate Conformal Imprint Lithography (SCIL)""; ""3.6. Large Area Imprint""

""3.7. Nanoelectrode Lithography""""3.8. Hybrid NIL Process""; ""3.9. Metal Nanoparticle Nanoimprinting Process""; ""3.10. High Resolution NIL""; ""3.11. Other NIL Processes""; ""4. NIL MATERIALS""; ""4.1. NIL Resists""; ""4.2. Functional Materials and Other Imprintable Materials""; ""4.3. Mold Materials""; ""5. PROSPECTS AND CHALLENGES IN NIL""; ""6. CONCLUSION""; ""ACKNOWLEDGMENTS""; ""REFERENCES""; ""NANOFABRICATION IN ELECTRONBEAM LITHOGRAPHY""; ""1. ELECTRON BEAM LITHOGRAPHY OVERVIEW""; ""1.1. Introduction to the Electron Beam Lithography System""; ""1.2. Proximity Effect""

""1.3. Numerical Calculation of the E-beam (Monte Carlo Method)""""2. CARBON NANOTUBE (CNT) BASED DEVICES""; ""2.1.Introduction to carbon nanotubes ""; ""2.2. VACNT Based FE Device with Individual Cathode Structures""; ""2.3. Field Emission Properties of Single Vertically Aligned Carbon Nanotubes""; ""2. VARIO""; ""2.4. Application in Micro CNT Column System""; ""3. FABRICATION OF 3D NANOSTRUCTURES ON CYLINDRICAL ROLLERS""; ""3.1. Introduction to Nanolithography""; ""3.2. In-House Field Emission Measurement Facility""; ""4. CONCLUSIONS""; ""ACKNOWLEDGMENT""; ""REFERENCES""

""GENERATION OF MICRO PATTERNS ONSIDE SURFACES OF POLYMER AND SISUBSTRATES USING A MICROPUNCHING LITHOGRAPHY APPROACH""""ABSTRACT""; ""1. INTRODUCTION""; ""2. MACROPUNCHING METHOD AND MPL""; ""3. AU SIDEWALL PATTERNS ON HDPE CHANNELS""; ""3.1. Fabrication Procedure""; ""3.2. Experimental Results and Discussions""; ""4. SUPER HYDROPHOBIC PDMS CHANNELS""; ""4.1. Fabrication Process""; ""4.2. Experimental Results and Discussions""; ""5. FABRICATION OF AU DOTS ON SI SIDEWALLS""; ""5.1. Fabrication Procedures""; ""5.2. Results and Discussions""; ""6. SUMMARY AND CONCLUSIONS""; ""ACKNOWLEDGMENTS""

""REFERENCES""""LITHOGRAPHY: PRINCIPLES,PROCESSES AND MATERIALS""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. PRINCIPLE OF LITHOGRAPHY""; ""3. PROCESSES OF LITHOGRAPHY""; ""3.1. RIE-NSL Lithography [32]""; ""3.2. FIB Lithography""; ""3.3. Laser Interference Lithography""; ""4. MATERIALS OF LITHOGRAPHY""; ""4.1. Materials of RIE-NSL Lithography""; ""4.2. Materials of FIB Lithography""; ""4.3. Materials of Laser Interference Lithography""; ""5. CONCLUSIONS""; ""REFERENCES""; ""LASER INTERFERENCE LITHOGRAPHY""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. THEORY""; ""3. INSTRUMENTATION""

""3.1. Choice of Laser""

Notes:

Description based upon print version of record.

Includes bibliographical references and index.

Description based on print version record.

ISBN:

1-61122-123-4

OCLC:

923657261