My Account Log in

4 options

Mosfet modeling for VLSI simulation : theory and practice / Narain Arora.

EBSCOhost Academic eBook Collection (North America) Available online

View online

EBSCOhost eBook Community College Collection Available online

View online

Ebook Central Academic Complete Available online

View online

eBook EngineeringCore Collection Available online

View online
Format:
Book
Author/Creator:
Arora, N. (Narain), 1943-
Series:
International series on advances in solid state electronics and technology.
International series on advances in solid state electronics and technology
Language:
English
Subjects (All):
Metal oxide semiconductor field-effect transistors.
Integrated circuits--Very large scale integration.
Integrated circuits.
Integrated circuits--Very large scale integration--Computer simulation.
Physical Description:
1 online resource (633 p.)
Edition:
1st ed.
Place of Publication:
Singapore : World Scientific, c2007.
Language Note:
English
Summary:
A reprint of the classic text, this book popularized compact modeling of electronic and semiconductor devices and components for college and graduate-school classrooms, and manufacturing engineering, over a decade ago. The first comprehensive book on MOS transistor compact modeling, it was the most cited among similar books in the area and remains the most frequently cited today. The coverage is device-physics based and continues to be relevant to the latest advances in MOS transistor modeling. This is also the only book that discusses in detail how to measure device model parameters required
Contents:
Foreword; Preface; Contents; List of Symbols; Acronyms; 1 Overview; 2 Review of Basic Semiconductor and pn Junction Theory; 3 MOS Transistor Structure and Operation; 4 MOS Capacitor; 5 Threshold Voltage; 6 MOSFET DC Model; 7 Dynamic Model; 8 Modeling Hot-Carrier Effects; 9 Data Acquisition and Model Parameter Measurements; 10 Model Parameter Extraction Using Optimization Method; 11 SPICE Diode and MOSFET Models and Their Parameters; 12 Statistical Modeling and Worst-case Design Parameters; Appendix A. Important Properties of Silicon, Silicon Dioxide and Silicon Nitride at 300K
Appendix B. Some Important Physical Constants at 300 KAppendix C. Unit Conversion Factors; Appendix D. Magnitude Prefixes; Appendix E. Methods of Calculating s from the Implicit Eq. (6.23) or (6.30); Appendix F. Charge Based MOSFET Intrinsic Capacitances; Appendix G. Linear Regression; Appendix H. Basic Statistical and Probability Theory; Appendix I. List of Widely Used Statistical Package Programs; 862-X1-missing.pdf; Subject Index
Notes:
Description based upon print version of record.
Includes bibliographical references and index.
ISBN:
1-281-12088-X
9786611120887
981-270-758-1
OCLC:
476099467

The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.

Find

Home Release notes

My Account

Shelf Request an item Bookmarks Fines and fees Settings

Guides

Using the Find catalog Using Articles+ Using your account