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ZnO nanostructures deposited by laser ablation / D. Valerini ... [et al.].

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Format:
Book
Author/Creator:
Valerini, D.
Series:
Nanotechnology Science and Technology
Nanotechnology science and technology
Language:
English
Subjects (All):
Nanostructured materials--Design and construction.
Nanostructured materials.
Pulsed laser deposition.
Zinc oxide thin films.
Physical Description:
1 online resource (80 p.)
Edition:
1st ed.
Place of Publication:
Hauppauge, NY : Nova Science Publishers, c2010.
Language Note:
English
Summary:
Zinc oxide (ZnO), particularly in its nanostructured forms, is one of the materials extensively studied in the last years due to the great number of its possible applications. Several growth techniques can be used to realise this kind of material and, among them, the Pulsed Laser Deposition (PLD) technique has been demonstrated to be a very versatile method to easily control the properties of the grown material. In this regard, this book aims to presents a review about the growth of zinc oxide (ZnO) nanostructured films by Pulsed Laser Deposition (PLD), and in particular by means of excimer laser ablation.
Contents:
""ZNO NANOSTRUCTURES DEPOSITED BY LASER ABLATION""; ""ZNO NANOSTRUCTURES DEPOSITED BY LASER ABLATION""; ""CONTENTS ""; ""PREFACE ""; ""INTRODUCTION""; ""1.1. PROPERTIES AND APPLICATIONS OF ZINC OXIDE AND ITS NANOSTRUCTURES ""; ""1.2. GROWTH TECHNIQUES FOR ZINC OXIDE NANOSTRUCTURES ""; ""ZINC OXIDE NANOSTRUCTURES BY LASER ABLATION: AN OVERVIEW ""; ""2.1. THE PULSED LASER DEPOSITION TECHNIQUE ""; "" 2.2. NANOSTRUCTURED ZINC OXIDE BY PLD IN THE WORLD ""; ""A) Kyushu University (Fukuoka, Japan), Fudan University (Shanghai, China), University of Miyazaki (Miyazaki, Japan) ""
""A1) Refs. [100,101,102,103] """"A2) Refs. [104,105,106,107,108,109] ""; ""A3) Ref. [110] ""; ""B) University of Bristol (Bristol, UK), Refs. 111,112,113,114,115] ""; ""C) University of Delhi (Delhi, India), University of Puerto Rico (San Juan, Puerto Rico), Harbin Institute of Technology (Harbin, China) ""; ""C1) Refs. [116,117] ""; ""C2) Refs. [118] ""; ""D) Osaka University (Osaka, Japan), Chiang Mai University (Muang Chiang Mai, Thailand), ref. [119]""; ""E) Korea Institute of Science and Technology (Seoul, Republic of Korea), ref. [120] ""
""K) University of Canterbury (Christchurch, New Zealand), The Macdiarmid Institute of Advanced Materials and Nanotechnology (New Zealand), Ref. [129] """"L) University of Technology (Dalian, China), ref. [130] ""; ""M) University of Salento (Lecce, Italy), refs. [131,132] ""; ""RESULTS ""; "" 3.1. EXPERIMENTAL PLD SET-UP AND DEPOSITION PARAMETERS ""; ""3.2. MORPHOLOGY ""; ""3.2.a. KrF-Deposited Samples (λ = 248 nm, E = 5 eV) ""; ""3.2.b. ArF-deposited Samples (λ = 193 nm, E = 6.42 eV) ""; ""3.2.c. Comparison between KrF and ArF -Deposited Samples ""
""3.3. SUMMARY OF OTHER CHARACTERIZATIONS """"3.4. GAS SENSING TESTS ""; ""CONCLUSION ""; ""ACKNOWLEDGMENTS ""; ""REFERENCES ""; ""INDEX ""
Notes:
Description based upon print version of record.
Includes bibliographical references (p. [59]-63) and index.
ISBN:
1-61761-770-9
OCLC:
670429463

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