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Novel materials processing by advanced electromagnetic energy sources (MAPEES'04) : proceedings of the International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources : March 19-22, 2004, Osaka, Japan / S. Miyake, editor-in-chief.
- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources (2004 : Osaka, Japan)
- Language:
- English
- Subjects (All):
- Electromagnetic waves--Congresses.
- Electromagnetic waves.
- Materials science--Congresses.
- Materials science.
- Materials--Electric properties--Congresses.
- Materials.
- Materials--Magnetic properties--Congresses.
- Physical Description:
- 1 online resource (477 p.)
- Edition:
- 1st ed.
- Other Title:
- MAPEES '04
- Place of Publication:
- Amsterdam ; Boston : Elsevier, 2005.
- Language Note:
- English
- Summary:
- Proceedings of the International Symposium in Novel Materials Processing by Advanced Electromagnetic Energy Sources (MAPEES'04)*Identifies and details recent progress achieved by advanced electromagnetic energy sources in materials processing.*Explores novel approaches to advanced electromagnetic energy processing of materials in an attempt to discover new and unique industrial fields.
- Contents:
- Cover; CONTENTS; Preface; Organizing Committee; Plenary Papers; Smart Processing Development of Novel Materials for Electromagnetic Wave Control; A Review of Cluster Ion Beam Process Technology; Plasma Processing; Structural Control of Nanocarbon Materials by Novel Plasma Processing (Invited); Amorphous Carbon Film Deposition by Magnetically-Driven Shunting Arc Discharge (Invited); RF Sheet-Plasma Source Using Permanent Magnets; Deposition Uniformity of Pulsed Vacuum Arc Ion Source
- Thermal Properties of Gravity-Free Gas-Arc Discharge Measured in a Jet Plane and Its Application Nano-Tube ProductionNew Method for Measuring Ion Energy in Pulsed Vacuum Arc; Relationship between H-/D- Production and Plasma Parameter Control with Magnetic Filter in Volume Negative Ion Sources; Novel Method to Increase Energy Density of Arc Plasma Jet; Material Coating Using Electromagnetically Accelerated Plasma Jet; Process Control of Carbon Nanotube Formation Using RF Glow-Discharge Plasma in Strong Magnetic Field
- Development of Arc Discharge Method in Organic Solvents for the Formation of DNA Encapsulated Carbon NanotubesEffects of Sputtering Due to Ion Irradiation on Plasma Anisotropic CVD of Cu; Evaluation of Contribution of Higher-Order Silane Radicals in Silane Discharges to Si-H2 Bond Formation in A-Si:H Films; Nanometer-Ranged Metallic Coatings by Noble Pulsed Cathodic Arc Deposition; Preparation of Hard Carbon Films by MCECR Plasma Sputtering Method; Microwave/Millimeter-Wave Processing; Micro- and Millimeter-Wave Processing of Advanced Materials at Karlsruhe Research Center (Invited)
- Simultaneous Use of Different High Frequency Energy Sources for Material Processing (Invited)High Power Submillimeter Wave Radiation Sources, Gyrotron FU Series (Invited); What Type of Transport Phenomena can be Induced by Microwave Field in Solids and How These Phenomena Contribute to Materials Processing (Invited); Powerful Electron Beams for Cyclotron Resonance Devices; Quasi-Stationary Electro-Thermal Heating Model for Microwave/Hybrid-Processed Materials Using Greens Function Techniques; Aerospace CFRP Structure Fabrication with the 2.45 GHz Hephaistos System
- Optimization of Slotted Waveguides for 2.45 GHz Applicators Using Nobel Slot TypesThe Role of High Pressure Plasma in Microwave Sintering Processes; Heating Behavior of Slags in 2.45 GHz Microwave Applicator; Rapid Heating by Single-Mode Cavity Controlled at 6 GHz; Millimeter-Wave Dielectric Measurement of SiC Powders as a Basis of Millimeter-Wave Sintering of Ceramics; Boron Carbide Ceramics Sintering by Using 24 GHz Compact Gyrotron; Instrumented Millimeter Wave Sintering of Mechanically Alloyed Amorphous Ceramic Powders for Bulk Nanocrystalline Synthesis
- Millimeter-Wave Effect on Sintering of Silicon Nitrides by 28 GHz Millimeter-Wave Radiation
- Notes:
- Description based upon print version of record.
- Includes bibliographical references and author index.
- ISBN:
- 1-280-63772-2
- 9786610637720
- 0-08-045612-X
- OCLC:
- 162130074
- Publisher Number:
- 9780080445045
- 978080445045
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