2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) / Institute of Electrical and Electronics Engineers.

Format:

Book

Author/Creator:

Institute of Electrical and Electronics Engineers, author, issuing body.

Language:

English

Subjects (All):

Integrated circuits--Very large scale integration--Congresses.

Integrated circuits.

Physical Description:

1 online resource (68 pages) : illustrations

Other Title:

2016 International Symposium on VLSI Technology, Systems and Application

Place of Publication:

Piscataway, NJ : IEEE, 2016.

Summary:

Annotation Low power CMOS and embedded memory Foundry technology RF process, device and integration technology Standalone memory DRAM, FLASH, emerging memory technology Advanced CMOS modules e g gate stack, contact, doping, strained channel, non Si integration, interconnect technology, etc Lithography directed self assembly, EUV, multiple patterning, etc Power and analog IC device and technology Advanced CMOS process and devices Ge, SiGe, III V, GAA, 2D 1D Process and device modeling TFT and organic electronics MEMS, imagers and sensors Advanced manufacturing technology, yield, reliability and test 3D ICs and advanced packaging Photonics Energy harvesting technology loT enabling technologies.

Notes:

Description based on publisher supplied metadata and other sources.

Includes bibliographical references.

ISBN:

9781467394789

1467394785