Database needs for modeling and simulation of plasma processing / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.

Format:

Book

Contributor:

National Research Council (U.S.). Panel on Database Needs in Plasma Processing.

Series:

Compass series (Washington, D.C.)

The compass series

Language:

English

Subjects (All):

Semiconductors--Design and construction--Congresses.

Semiconductors.

Plasma engineering--Databases--Congresses.

Plasma engineering.

Plasma engineering--Computer simulation--Congresses.

Physical Description:

1 online resource (74 p.)

Edition:

1st ed.

Place of Publication:

Washington, D.C. : National Academy Press, 1996.

Language Note:

English

Summary:

In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

Contents:

""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS""

""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS""

""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes ""

""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination""

""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants""

Notes:

Description based upon print version of record.

Includes bibliographical references.

ISBN:

9780309175135

0309175135

9780309573535

030957353X

9780585084541

0585084548

OCLC:

923265516