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Plasma processing of materials : scientific opportunities and technological challenges / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.

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Format:
Book
Author/Creator:
National Research Council (U.S.). Panel on Plasma Processing of Materials.
Language:
English
Subjects (All):
Plasma engineering.
Microelectronics--Materials--Effect of radiation on.
Microelectronics.
Surfaces (Technology).
Physical Description:
1 online resource (87 p.)
Edition:
1st ed.
Place of Publication:
Washington, D.C. : National Academy Press, 1991.
Language Note:
English
Summary:
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the world--electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Contents:
Plasma Processing of Materials:
Copyright
Preface
Acknowledgments
Contents
1 Summary, Findings, Conclusions, And Recommendations
SUMMARY
FINDINGS, CONCLUSIONS, AND RECOMMENDATIONS
2 Plasma Processing And Low-Energy Plasma Science
CLASSIFICATION OF PLASMAS
BRIEF HISTORY OF LOW-ENERGY PLASMA SCIENCE AND TECHNOLOGY
INDUSTRIAL APPLICATIONS OF PLASMA PROCESSING OF MATERIALS
INTERFACE BETWEEN BASIC PLASMA SCIENCE AND APPLICATIONS
SCOPE OF THIS REPORT
3 Plasma Processing In The Electronics Industry
MICROELECTRONICS FABRICATION
PLASMA ETCHING
Anisotropy
Selectivity
Uniformity
Damage
New Materials
PLASMA DEPOSITION
Planarization, Filling, and Interconnection
Surface Modification
PLASMA CLEANING
LOW-PRESSURE PLASMA REACTOR TECHNOLOGY
Single-Wafer Processing
Process Control
New Plasma Sources
Magnetic Confinement
Downstream Processing
Modulated Processing
Clustered Processing
THERMAL PLASMA REACTOR TECHNOLOGY
TOWARD FLEXIBLE MICROELECTRONICS MANUFACTURING
FINDINGS AND CONCLUSIONS
4 Scientific Foundation of Plasma Processing
SURFACE PROCESSES
Theory and Simulation
Experimental Studies
Beam-Surface Experiments
Ex Situ Analysis
PLASMA GENERATION AND TRANSPORT
Low-Pressure Plasma Modeling
Analysis
Fluid Simulations
Particle-In-Cell and Kinetic Simulations
Thermal Plasma Modeling
Toward Cad Tools And Expert Systems
Chemical Kinetics
Multidimensional Modeling and Magnetic Effects
Stability of Processing Plasmas
Accuracy and Reliability of Numerical Simulation Methods
Plasma Diagnostics
Positive Ions and Neutrals
Electron Density and Energy Distribution
Fields
Negative Ions
Particulates
Reference Reactors
Data Base for Plasma Generation and Transport
Present Status.
Needs
Distribution of Information
PLASMA-SURFACE INTERACTIONS
Boundary Conditions
Passive Surfaces
Microstructure Evolution
In Situ Analysis
FUNDING FOR PLASMA PROCESSING RESEARCH
Japanese Research
French Research
5 Educational Issues
EDUCATIONAL REQUIREMENTS FOR UNDERGRADUATES
Laboratory Courses and the Scientific Method
Research Experiences and Cooperative Programs
U.S. GRADUATE EDUCATION
TEXTS AND COMPUTER-AIDED INSTRUCTION
FACULTY DEVELOPMENT
CONTINUING EDUCATION
FOREIGN EDUCATIONAL OFFERINGS
Japan
France
Appendix Participants in Workshop on Plasma Processing of Materials.
Notes:
Bibliographic Level Mode of Issuance: Monograph
ISBN:
9786610203369
9781280203367
1280203366
9780309583756
0309583756
9780585084633
0585084637
OCLC:
43475627

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