2 options
2002 8th International Symposium on Plasma- and Process-Induced Damage. April 24-25, 2003, Corbeil-Essonnes, France / Koji Eriguchi, S. Krishnan, and Terence Hook, editors ; [technical co-sponsors, IEEE/Electron Devices Society, Japanese Society of Applied Physics].
- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Plasma Process-Induced Damage (8th : 2003 : Corbeil-Essonnes, France)
- Language:
- English
- Subjects (All):
- Semiconductor wafers--Congresses.
- Semiconductor wafers.
- Semiconductors--Effect of radiation on--Congresses.
- Semiconductors.
- Semiconductors--Effect of radiation on.
- Plasma radiation--Congresses.
- Plasma radiation.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- vi unnumbered pages, 189 pages : illustrations
- Other Title:
- P²ID
- Plasma- and process-induced damage
- Plasma process induced-damage
- Plasma- and Process-Induced Damage, 2003 8th International Symposium.
- Place of Publication:
- Pisctaway, N.J. : IEEE, [2003]
- System Details:
- Mode of access: World Wide Web.
- text file
- Notes:
- Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.
- "P²ID"--Cover.
- "IEEE Catalog Number 03TH8669"--T.p. verso.
- Includes bibliographical references and author index.
- ISBN:
- 0780377478
- 9780780377479
- OCLC:
- 52192967
- Access Restriction:
- Restricted for use by site license.
- Online:
- Table of contents only
The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.