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2000 5th International Symposium on Plasma Process-Induced Damage. May 22-24, 2000, Santa Clara, California, USA / Mitsumasa Koyanagi, Manfred Englehardt, and Calvin T. Gabriel, editors ; technical co-sponsors, American Vacuum Society, IEEE/Electron devices Society, Japanese Society of Applied Physics.
Connect to full text Available online
View online- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Plasma Process-Induced Damage (5th : 2000 : Santa Clara, Calif.)
- Language:
- English
- Subjects (All):
- Semiconductor wafers--Congresses.
- Semiconductor wafers.
- Semiconductors--Effect of radiation on--Congresses.
- Semiconductors.
- Semiconductors--Effect of radiation on.
- Plasma radiation--Congresses.
- Plasma radiation.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 6 unnumbered pages, i, 172 pages : illustrations
- Other Title:
- P²ID
- Plasma Process-Induced Damage, 2000 5th International Symposium on.
- Place of Publication:
- Santa Clara, Calif. : Northern California Chapter of the American Vacuum Society, [2000]
- System Details:
- Mode of access: World Wide Web.
- text file
- Notes:
- "P²ID"--Cover.
- "IEEE Catalog Number 00TH8479"--T.p. verso.
- Includes bibliographical references and author index.
- ISBN:
- 0965157741
- 9780965157742
- OCLC:
- 45300774
- Access Restriction:
- Restricted for use by site license.
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