1999 4th International Workshop on Statistical Metrology / technical co-sponsored by IEEE Electron Devices Society ; co-sponsored by VLSI symposium, the Japan Society of Applied Physics, IEEE ED Tokyo Chapter ; in cooperation with the Institute of Electronics, Information and Communication Engineers.

Format:

Book

Conference/Event

Contributor:

IEEE Xplore (Online service)

IEEE Electron Devices Society.

Conference Name:

International Workshop on Statistical Metrology (4th : 1999 : Kyoto, Japan)

Language:

English

Subjects (All):

Semiconductors--Characterization--Statistical methods--Congresses.

Semiconductors.

Semiconductors--Measurement--Congresses.

Semiconductors--Measurement.

Semiconductors--Characterization.

Statistics.

Genre:

Conference papers and proceedings.

Physical Description:

vi, 65 pages : illustrations

Other Title:

4th International Workshop on Statistical Metrology

Statistical Metrology, 1999, IWSM, 1999 4th International Workshop on.

Place of Publication:

Piscataway, NJ, USA : Purchased from : IEEE Service Center Single Publication Sales Unit, [1999]

System Details:

Mode of access: World Wide Web.

text file

Summary:

This Workshop is a forum for discussion of issues in the generation and utilization of statistically significant measurements to characterize and validate VLSI processes, designs, and equipment operations. Innovative analysis techniques are used to convert raw measurements of confounded statistical and systematic variations into useful parameters that model the behavior of real processes and wafers. In this way, the coupling of statistical data from manufacturing to circuit and process design is enabled. Statistical Metrology is emerging as a necessary methodology to contain the cost and cycle time of advanced IC design and production.

Notes:

"IWSM."

"IEEE Cat. No. 99TH8391."

Includes bibliographical references.

ISBN:

0780351541

9780780351547

078035155X

9780780351554

OCLC:

45094207

Access Restriction:

Restricted for use by site license.