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1996 1st International Symposium on Plasma Process-Induced Damage. 13-14 May 1996, Santa Clara, California, USA / Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics.
Connect to full text Available online
View online- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Plasma Process-Induced Damage (1st : 1996 : Santa Clara, Calif.)
- Language:
- English
- Subjects (All):
- Semiconductor wafers--Congresses.
- Semiconductor wafers.
- Semiconductors--Effect of radiation on--Congresses.
- Semiconductors.
- Semiconductors--Effect of radiation on.
- Plasma radiation--Congresses.
- Plasma radiation.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 237 pages : illustrations
- Other Title:
- Plasma Process-Induced Damage, 1996 1st International Symposium on.
- Place of Publication:
- Sunnyvale, CA : Northern California Chapter of the American Vacuum Society, [1996]
- System Details:
- Mode of access: World Wide Web.
- text file
- Notes:
- "IEEE Catalog No. 96TH8142"--T.p. verso.
- Includes bibliographical references and index.
- ISBN:
- 0965157709
- 9780965157704
- 0780330617
- 9780780330610
- OCLC:
- 35121812
- Access Restriction:
- Restricted for use by site license.
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