Focused ion beam systems : basics and applications / edited by Nan Yao.

Format:

Book

Contributor:

Yao, Nan.

Language:

English

Subjects (All):

Focused ion beams.

Focused ion beams--Industrial applications.

Physical Description:

xi, 395 pages : illustrations ; 26 cm

Place of Publication:

Cambridge ; New York : Cambridge University Press, 2007.

Summary:

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a two-beam system: a single system that can function as an imaging, analytical, and sample modification tool. Presenting the principles, capabilities, challenges, and applications of the FIB technique, this edited volume comprehensively covers the state-of-the-art in ion beam technology including the two-beam system.

The basic principles of ion beam and two-beam systems, their interaction with materials, etching, and deposition are all covered, as well as in-situ materials characterization, sample preparation, three-dimension reconstruction, and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic, and magnetic devices, this self-contained working knowledge of the full range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering, and nanotechnology.

Contents:

2 Interaction of ions with matter / Nobutsugu Imanishi 31

3 Gas assisted ion beam etching and deposition / Hyoung Ho (Chris) Kang, Clive Chandler, Matthew Weschler 67

4 Imaging using electrons and ion beams / Kaoru Ohya, Tohru Ishitani 87

5 Characterization methods using FIB/SEM DualBeam instrumentation / Steve Reyntjens, Lucille A. Giannuzzi 126

6 High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling / E. L. Principe 146

7 Fabrication of nanoscale structures using ion beams / Ampere A. Tseng 187

8 Preparation for physico-chemical analysis / Richard Langford 215

9 In-situ sample manipulation and imaging / T. Kamino, T. Yaguchi, T. Ohnishi, T. Ishitani 250

10 Micro-machining and mask repair / Mark Utlaut 268

11 Three-dimensional visualization of nanostructured materials using focused ion beam tomography / Derren Dunn, Alan J. Kubis, Robert Hull 295

12 Ion beam implantation of surface layers / Daniel Recht, Nan Yao 318

13 Applications for biological materials / Kirk Hou, Nan Yao 337

14 Focused ion beam systems as a multifunctional tool for nanotechnology / Toshiaki Fujii, Tatsuya Asahata, Takashi Kaito 355.

Notes:

Includes bibliographical references and index.

ISBN:

9780521831994

0521831997

OCLC:

137221635