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Microlithography : science and technology / edited by Kazuaki Suzuki, Bruce W. Smith.
Table of contents only Available online
View onlineLIBRA TK7836 .M525 2007
Available from offsite location
- Format:
- Book
- Series:
- Optical science and engineering (CRC Press) ; 126.
- Optical science and engineering ; 126
- Language:
- English
- Subjects (All):
- Microlithography--Industrial applications.
- Microlithography.
- Integrated circuits--Masks.
- Integrated circuits.
- Metal oxide semiconductors, Complementary--Design and construction.
- Metal oxide semiconductors, Complementary.
- Manufacturing processes.
- Physical Description:
- 848 pages : illustrations ; 27 cm.
- Edition:
- Second edition.
- Place of Publication:
- Boca Raton : CRC Press, [2007]
- Summary:
- Like the bestselling original, this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies, this edition includes coverage of immersion lithography, extreme ultraviolet (EUV) lithography, imprint lithography, photoresists for 193nm and immersion lithography, and scatterometry. The authors cover mechanical systems, optics, excimer laser light sources, and alignment techniques and analysis, as well as resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, and metrology.
- Notes:
- Includes bibliographical references and index.
- Local Notes:
- Acquired for the Penn Libraries with assistance from the Alumni and Friends Memorial Book Fund.
- ISBN:
- 9780824790240
- 0824790243
- OCLC:
- 71581976
- Online:
- Publisher description
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