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Developments in semiconductor microlithography : [seminar] : June 1-3, 1976, San Jose, California / Donald E. Routh ... [and others] editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics.
LIBRA TK7871.85 .D49
Available from offsite location
- Format:
- Book
- Series:
- Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 80.
- Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 80
- Language:
- English
- Subjects (All):
- Semiconductors--Congresses.
- Semiconductors.
- Photolithography--Congresses.
- Photolithography.
- Microelectronics--Congresses.
- Microelectronics.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- vi, 146 pages : illustrations ; 28 cm.
- Place of Publication:
- Palos Verdes Estates, Calif. : SPIE, 1976.
- Notes:
- Includes bibliographical references and indexes.
- ISBN:
- 0892521074
- OCLC:
- 3073237
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