Polymers for microelectronics and nanolectronics / Qinghuang Lin, editor ; Raymond A. Pearson, editor ; Jeffrey C. Hedrick, editor.

Format:

Book

Contributor:

Lin, Qinghuang, 1963-

Pearson, R. A., 1958-

Hedrick, Jeffrey C.

Rosengarten Family Fund.

Series:

ACS symposium series ; 874.

ACS symposium series ; 874

Language:

English

Subjects (All):

Polymers--Congresses.

Polymers.

Microelectronics--Materials--Congresses.

Microelectronics.

Microelectronics--Materials.

Molecular electronics--Materials--Congresses.

Molecular electronics.

Molecular electronics--Materials.

Genre:

Conference papers and proceedings.

Physical Description:

xii, 335 pages : illustrations ; 24 cm.

Place of Publication:

Washington, DC : American Chemical Society, 2004.

Summary:

Discusses patterning, insulating, and packaging polymeric materials for the $150-billion microelectronics industry as well as the rapidly emerging nanoelectronics and organic electronics industries. Chapters discuss patterning, insulating, and packaging polymeric materials as well as organic materials for nanoelectronics, organic electronics, and optoelectronics. This book covers the synthesis, characterization, structure-property relationship, performance, and applications of these materials.

Contents:

1. Recent Progress in Materials for Organic Electronics / Zhenan Bao 1

2. PPV Nanotubes, Nanorods, and Nanofilms as well as Carbonized Objects Derived Therefrom / Kyungkon Kim, Guolun Zhong, Jung-Il Jin, Jung Ho Park, Seoung Hyun Lee, Dong Woo Kim, Yung Woo Park, Whikun Yi 15

3. Layer-by-Layer Assembly of Molecular Materials for Electrooptical Applications / M. E. van der Boom, T. J. Marks 30

4. Oxidative Solid-State Cross-Linking of Polymer Precursors to Pattern Intrinsically Conducting Polymers / Sung-Yeon Jang, Manuel Marquez, Gregory A. Sotzing 44

5. Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography / T. H. Fedynyshyn, W. A. Mowers, R. R. Kunz, R. F. Sinta, M. Sworin, A. Cabral, J. Curtin 54

6. 157-nm Resist Materials Using Main-Chain Fluorinated Polymers / Toshiro Itani, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Naomi Shida, Minoru Toriumi 72

7. Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists / Ronald L. Jones, Vivek M. Prabhu, Dario L. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph L. Lenhart, Wen-li Wu, Marie Angelopoulos 86

8. Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography / Joseph L. Lenhart, Daniel A. Fischer, Sharadha Sambasivan, Eric K. Lin, Christopher L. Soles, Ronald L. Jones, Wen-li Wu, Dario L. Goldfarb, Marie Angelopoulos 98

9. Photolabile Ultrathin Polymer Films for Spatially Defined Attachment of Nano Elements / B. Voit, F. Braun, Ch. Loppacher, S. Trogisch, L. M. Eng, R. Seidel, A. Gorbunoff, W. Pompe, M. Mertig 118

10. Soft Lithography on Block Copolymer Films: Generating Functionalized Patterns on Block Copolymer Films as a Basis to Further Surface Modification / Martin Brehmer, Lars Conrad, Lutz Funk, Dirk Allard, Patrick Theato, Anke Helfer 129

11. Nanoporous, Low-Dielectric Constant Organosilicate Materials Derived from Inorganic Polymer Blends / R. D. Miller, W. Volksen, V. Y. Lee, E. Connor, T. Magbitang, R. Zafran, L. Sundberg, C. J. Hawker, J. L. Hedrick, E. Huang, M. Toney, Q. R. Huang, C. W. Frank, H.-C. Kim 144

12. Porous Low-k Dielectrics: Material Properties / C. Tyberg, E. Huang, J. Hedrick, E. Simonyi, S. Gates, S. Cohen, K. Malone, H. Wickland, M. Sankarapandian, M. Toney, H.-C. Kim, R. Miller, W. Volksen, P. Rice, L. Lurio 161

13. Ultra Low-k Dielectric Films with Ultra Small Pores Using Poragens Chemically Bonded to Siloxane Resin / Bianxiao Zhong, Eric S. Moyer 173

14. Design of Nanoporous Polyarylene Polymers for Use as Low-k Dielectrics in Microelectronic Devices / H. Craig Silvis, Kevin J. Bouck, James P. Godschalx, Q. Jason Niu, Michael J. Radler, Ted M. Stokich, John W. Lyons, Brandon J. Kern, Joan G. Marshall, Karin Syverud, Mary Leff 187

15. Molecular Brushes as Templating Agents for Nanoporous SiLK* Dielectric Films / Q. Jason Niu, Steven J. Martin, James P. Godschalx, Paul H. Townsend 199

16. X-ray Reflectivity as a Metrology to Characterize Pores in Low-k Dielectric Films / Christopher L. Soles, Hae-Jeong Lee, Ronald C. Hedden, Da-wei Liu, Barry J. Bauer, Wen-li Wu 209

17. Micro- and Nanoporous Materials Developed Using Supercritical CO[subscript 2]: Novel Synthetic Methods for the Development of Micro- and Nanoporous Materials Toward Microelectronic Applications / Sara N. Paisner, Joseph M. DeSimone 223

18. Thermally Degradable Photocross-Linking Polymers / Masamitsu Shirai, Satoshi Morishita, Akiya Kawaue, Haruyuki Okamura, Masahiro Tsunooka 236

19. Evaluation of Infrared Spectroscopic Techniques to Asses Molecular Interactions / Robert K. Oldak, Raymond A. Pearson 251

20. Study on Metal Chelates as Catalysts of Epoxy and Anhydride Cure Reactions for No-Flow Underfill Applications / Zhuqing Zhang, C. P. Wong 264

21. Benzocyclobutene-Based Polymers for Microelectronic Applications / Ying-Hung So, Phil E. Garrou, Jang-Hi Im, Karou Ohba 279

22. Formation of Nanocomposites by In Situ Intercalative Polymerization of 2-Ethynylpyrdine in Layered Aluminosilicates: A Solid-State NMR Study / A. L. Cholli, S. K. Sahoo, D. W. Kim, J. Kumar, A. Blumstein 294.

Notes:

Based on selected papers from the ACS symposium entitled: Polymers for micro- and nano-electronics, held in August 18-22, 2002 in Boston, Massachusetts.

Includes bibliographical references and indexes.

Local Notes:

Acquired for the Penn Libraries with assistance from the Rosengarten Family Fund.

ISBN:

084123857X

OCLC:

53306497