Practical design and production of optical thin films / Ronald R. Willey.

Format:

Book

Author/Creator:

Willey, Ronald R., 1936-

Contributor:

Rosengarten Family Fund.

Series:

Optical engineering (Marcel Dekker, Inc.) ; v. 79.

Optical engineering ; 79

Language:

English

Subjects (All):

Optical coatings.

Thin films.

Optical films.

Physical Description:

xi, 547 pages : illustrations ; 24 cm.

Edition:

Second edition, revised and expanded.

Place of Publication:

New York : Marcel Dekker, [2002]

Contents:

1 Fundamentals of Thin Film Optics and the Use of Graphical Methods in Thin Film Design 1

1.2. Review of Thin Film Optics Principles 5

1.3. Reflectance Diagrams 8

1.3.1. Low Reflectors, Antireflection Coatings 10

1.3.2. High Reflectors 19

1.3.3. Narrow Bandpass Pass Filters 22

1.3.4. Beamsplitters 30

1.3.5. Three-Layer AR Coating on Germanium, Example 34

1.3.6. Example Four-Layer Broad Band AR Coating in the Visible 36

1.3.7. Physical Thickness versus Optical Thickness 36

1.4. Admittance Diagrams 36

1.5. Triangle Diagrams 39

1.5.1. Designing Coatings with Absorbing Materials 40

1.6. Approximations of Indices and Designs 61

1.7. Inhomogeneous Index Functions 65

1.7.1. Low Index Limitations 74

1.7.2. A Fourier Approach 77

1.8. Optimization 83

1.8.1. Performance Goals and Weightings 84

1.8.2. Constraints 85

1.8.3. Global versus Local Minima 85

1.8.4. Some Optimizing Concepts 86

2 Estimating What Can Be Done Before Designing 91

2.2. Antireflection Coatings 91

2.2.1. Procedure 92

2.2.2. The Formula 93

2.2.3. Results 95

2.2.4. Summary of Antireflection Coating Estimation 101

2.3. Bandpass and Blocker Coatings 101

2.3.1. Estimating the Width of a Blocking Band 102

2.3.2. Estimating the Optical Density of a Blocking Band 104

2.3.3. Estimating the Number of Layers and Thickness Needed 105

2.3.4. Estimating More Complex Coatings 105

2.3.5. Estimating Edge Filter Passband Reflection Losses 111

2.4. Dichroic Reflection Coatings 121

2.5. Dwdm Filters 123

3 Fourier Viewpoint of Optical Coatings 129

3.2. Fourier Concepts 129

3.2.2. Some Limitations 134

3.2.3. A Method to Determine the Multiple Reflections 137

3.2.4. Overcoming Low Index Limitations with Thickness 139

3.3. Designing a Very Broad Band Ar Coating 147

4 Typical Equipment for Optical Coating Production 150

4.2. General Requirements 151

4.2.1. The Vacuum 152

4.2.2. Evaporation Sources 167

4.2.3. Fixturing and Uniformity 191

4.2.4. Temperature Control 201

4.2.5. Process Control 205

4.3. Typical Equipment 208

4.4. Alternative Approaches 213

4.5. Utilities 213

5 Materials and Process Know-How 221

5.1.0. Measuring Spectral Results in the Real World 222

5.1.1. Index of Refraction Determination 232

5.2. Process Know-How 243

5.2.1. Film Growth Models and Observations 244

5.2.2. Chiral and Sculptured Coatings 249

5.2.3. Stress in Coatings 249

5.2.4. Laser Damage in Coatings 252

5.2.5. Rain Erosion of Coatings 255

5.3. Materials 257

5.3.1. Some Specific Materials 258

5.4. Ion Sources 308

5.4.1. Cold Cathode Source 310

5.4.2. End-Hall Source 312

5.4.3. PS1500 Plasma/Ion Source 315

5.5. Other Processes to Consider 328

5.5.0. Surface Preparation and Cleaning 328

5.5.1. Physical Vapor Deposition 329

5.5.2. Dip, Spin, and Spray Coatings 330

5.5.3. Chemical Vapor Deposition 331

5.5.4. Plasma-Enhanced CVD 331

5.5.5. Plasma Polymerization 332

5.5.6. Hard Carbon Coatings 333

6 Process Development 360

6.2. Design of Experiments Methodology 364

6.2.1. Process Flow Diagram 364

6.2.2. Cause-and-Effect Diagram 366

6.2.3. Control, Noise, or Experiment 366

6.2.4. Standard Operating Procedures 369

6.3. Design of the Experiments: Examples 369

6.3.1. A Central Composite Design for Aluminizing 371

6.3.2. A Box-Behnken Design for IAD Deposition of TiO[subscript 2] 375

7 Monitoring and Control of Thin Film Growth 382

7.2. Effects of Errors 384

7.3. Ways to Monitor 388

7.3.1. Measured Charge 388

7.3.2. Time/Rate Monitoring 390

7.3.3. Crystal Monitoring 391

7.3.4. Optical Thickness Monitors 392

7.3.5. Trade-offs in Monitoring 398

7.4. Error Compensation and Degree of Control 400

7.4.1. Narrow Bandpass Filter Monitoring 401

7.4.2. DWDM Filter Monitoring 405

7.4.3. Error Compensation in Edge Filters 427

7.4.4. Broad Band Monitoring Compensation 428

7.4.5. Effects of Thin Film Wedge on the Monitor Chip 429

7.4.6. Error Due to Width of the Monitoring Passband 431

7.5. Calibrations and Variations 433

7.5.1. Tooling Factors 434

7.5.2. Variations 435

7.5.3. The Optical Monitor with Crystal Method of Schroedter 436

7.5.4. Suggestion for Computer-Aided Monitoring 438

7.6. Sensitivity and Strategies 439

7.6.1. Sensitivity versus Layer Termination Point in Reflectance 440

7.6.2. Sensitivity versus g-Value 441

7.6.3. Precoated Monitor Chips 445

7.6.4. Eliminating the Precoated Chip 445

7.6.5. Constant Level Monitoring Strategies 453

7.6.6. Steering the Monitoring Signal Result 458

7.6.7. Variation of Band-Edge Position with Monitoring Errors 467

7.6.8. Almost Achromatic Absentee Layers 476

7.7. Practical Considerations 479

7.7.1. A Narrow Bandpass Filter 479

7.7.2. A Special "Multichroic" Beamsplitter 480

7.7.3. A Very Broadband Antireflection Coating 481

7.7.4. Single Beam versus Double Beam Optical Monitors 488

7.7.5. Automation versus Manual Monitoring 489

Appendix Metallic and Semiconductor Material Graphs 497.

Notes:

Includes bibliographical references and indexes.

Local Notes:

Acquired for the Penn Libraries with assistance from the Rosengarten Family Fund.

ISBN:

0824708490

OCLC:

49942221