Papers from the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication : 30 May-2 June 2000, Rancho Las Palmas, Marriott Resort, Rancho Mirage, California / sponsored by the American Vacuum Society in cooperation with the Electron Device Society of the Institute of Electrical and Electronics Engineers and the Optical Society of America ; editor for the proceedings, John Melngailis.

Format:

Book

Conference/Event

Contributor:

Melngailis, John.

American Vacuum Society.

IEEE Electron Devices Society.

Optical Society of America.

Conference Name:

International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (44th : 2000 : Rancho Mirage, Calif.)

Series:

Journal of vacuum science & technology. Microelectronics and nanometer structures, 0734-211X ; B, 2nd ser., v. 18, no. 6, N/D 2000.

Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 0734-211X ; 2nd ser., v. 18, no. 6, N/D 2000

Language:

English

Subjects (All):

Photolithography--Congresses.

Photolithography.

Lithography, Electron beam--Congresses.

Lithography, Electron beam.

Ion beam lithography--Congresses.

Ion beam lithography.

X-ray lithography--Congresses.

X-ray lithography.

Nanotechnology--Congresses.

Nanotechnology.

Genre:

Conference papers and proceedings.

Physical Description:

pages [2865]-3614 : illustrations ; 29 cm.

Other Title:

Papers from the forty-fourth International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Place of Publication:

New York : Published by the American Vacuum Society through the American Institute of Physics, 2000.

Notes:

Includes bibliographical references and indexes.

ISBN:

1563969696

OCLC:

45862826