Micro- and nanopatterning polymers / Hiroshi Ito, editor ... [and others].

Format:

Book

Contributor:

Ito, Hiroshi.

American Chemical Society. Division of Polymeric Materials: Science and Engineering.

American Chemical Society. Meeting 1997 : Las Vegas, Nev.)

Series:

ACS symposium series 0097-6156 ; 706.

ACS symposium series, 0097-6156 ; 706

Language:

English

Subjects (All):

Microelectronics--Materials.

Microelectronics.

Polymeric composites.

Photoresists--Materials.

Photoresists.

Genre:

Conference papers and proceedings.

Physical Description:

xii, 386 pages : illustrations ; 24 cm.

Place of Publication:

Washington, DC : American Chemical Society : Distributed by Oxford University Press, [1998]

Contents:

Novel Patterning Chemistry and Processing

1. Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison, Miri Park, Paul M. Chaikin, Richard A. Register, Douglas H. Adamson 2

2. Inorganic Nanostructures on Surfaces Using Micellar Diblock Copolymer Templates / Joachim P. Spatz, Thomas Herzog, Stefan Mossmer, Paul Ziemann, Martin Moller 12

3. Synthesis of Stereoregular Polymers as Precursors to Highly Conducting Carbon for Use in Applications in Micro- and Nanolithography / C. B. Gorman, R. W. Vest, J. L. Snover, T. L. Utz, S. A. Serron 26

4. Metallization on Poly(tetrafluoroethylene) Substrate by Excimer-Laser-Induced Surface Reaction and Chemical Plating / Hiroyuki Niino, Akira Yabe 40

5. An Inorganic Approach to Photolithography: The Photolithographic Deposition of Dielectric Metal Oxide Films / Ross H. Hill, Sharon L. Blair 53

6. Molding of Polymeric Microstructures / T. Hanemann, V. Piotter, R. Ruprecht, J. H. Hausselt 67

Microlithographic Chemistry and Processing

7. Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists / H.-T. Schacht, P. Falcigno, N. Munzel, R. Schulz, A. Medina 78

8. Chemistry of Ketal Resist System and Its Lithographic Performance / Wu-Song Huang, Kim Y. Lee, Rao Bantu, Ranee Kwong, Ahmad Katnani, Mahmoud Khojasteh, William Brunsvold, Steven Holmes, Ronald Nunes, Tsuyoshi Shibata, George Orsula, James Cameron, Dominic Yang, Roger Sinta 95

9. Photoacid Diffusion in Chemically Amplified DUV Resists / Toshiro Itani, Hiroshi Yoshino, Shuichi Hashimoto, Mitsuharu Yamana, Norihiko Samoto, Kunihiko Kasama 110

10. Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists / Kieko Harada, Masahito Kushida, Kyoichi Saito, Kazuyuki Sugita, Hirotada Iida 126

11. Exploration of Chemically Amplified Resist Mechanisms and Performance at Small Linewidths / James W. Taylor, Paul M. Dentinger, Steven J. Rhyner, Geoffrey W. Reynolds 134

12. The Preparation and Investigation of Macromolecular Architectures for Microlithography by "Living" Free Radical Polymerization / G. G. Barclay, M. King, A. Orellana, P. R. L. Malenfant, R. Sinta, E. Malmstrom, H. Ito, C. J. Hawker 144

13. Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging / Kunihiro Ichimura, Koji Arimitsu, Soh Noguchi, Kazuaki Kudo 161

Advanced Microlithographic Materials Chemistry and Processing

14. Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography / Uzodinma Okoroanyanwu, Jeffrey D. Byers, Ti Cao, Stephen E. Webber, C. Grant Willson 174

15. 193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties / F. M. Houlihan, A. Timko, R. Hutton, R. Cirelli, J. M. Kometani, Elsa Reichmanis, O. Nalamasu 191

16. Synthesis and Evaluation of Alicyclic Backbone Polymers for 193 nm Lithography / Hiroshi Ito, Norbert Seehof, Rikiya Sato, Tomonari Nakayama, Mitsuru Ueda 208

17. Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists / Robert D. Allen, Juliann Opitz, Carl E. Larson, Thomas I. Wallow, Richard A. DiPietro, Gregory Breyta, Ratnam Sooriyakumaran, Donald C. Hofer 224

18. Calixarene and Dendrimer as Novel Photoresist Materials / Osamu Haba, Daisuke Takahashi, Kohji Haga, Yoshimasa Sakai, Tomonari Nakayama, Mitsuru Ueda 237

19. Calixarene Resists for Nanolithography / Yoshitake Ohnishi, Naoko Wamme, Jun-ichi Fujita 249

20 Design and Preliminary Studies of Environmentally Enhanced Water-Castable, Water-Developable Positive Tone Resists: Model and Feasibility Studies / Jennifer M. Havard, Dario Pasini, Jean M. J. Frechet, David Medeiros, Shintario Yamada, C. Grant Willson 262

21. Molecular Design for New Positive Electron-Beam Resists / Yukio Nagasaki 276

Lithographic Materials and Processes

22. The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach / Christopher L. McAdams, Wang Yueh, Pavlos Tsiartas, Dale Hsieh, C. Grant Willson 292

23. Photoacid Generating Polymers for Surface Modification Resists / Masamitsu Shirai, Mitsuho Masuda, Masahiro Tsunooka, Masayuki Endo, Takahiro Matsuo 306

24. Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists / Pushkara Rao Varanasi, Hiroshi Ito, Phil Brock, Gregory Breyta, William R. Brunsvold, Ahmad D. Katnani 320

25. Advanced Chemically Amplified Resist Process Using Non-Ammonia Generating Adhesion Promoter / M. Endo, A. Katsuyama 337

26. Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists / P. Argitis, S. Boyatzis, I. Raptis, N. Glezos, M. Hatzakis 345

27. Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer / T. Ueno, Y. Okabe, T. Miwa, Y. Maekawa, G. Rames-Langlade 358.

Notes:

"Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 214th ACS National Meeting, Las Vegas, Nevada, September 7-11, 1997."

Includes bibliographical references and indexes.

ISBN:

0841235813

OCLC:

39257282