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Plasma processing of semiconductors / edited by P.F. Williams.
LIBRA TA2020 .P532 1997
Available from offsite location
- Format:
- Book
- Series:
- NATO ASI series. Applied sciences ; Series E, no. 336.
- NATO ASI series. Series E., Applied sciences ; vol. 336
- Language:
- English
- Subjects (All):
- Plasma engineering.
- Semiconductors--Etching.
- Semiconductors.
- Plasma etching--Industrial applications.
- Plasma etching.
- Plasma chemistry--Industrial applications.
- Plasma chemistry.
- Physical Description:
- x, 613 pages : illustrations ; 25 cm.
- Place of Publication:
- Dordrecht ; Boston : Kluwer, [1997]
- Summary:
- Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
- Notes:
- Includes bibliographical references and index.
- ISBN:
- 0792345673
- OCLC:
- 36746516
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